Кл.слова (ненормированные):
Fe-Si interlayer -- magnetic nanostructures -- Fe silicides -- reflectivity -- conversion electron Möossbauer spectroscopy
Аннотация: Diffusion and reaction of elements at the interfaces of nanostructured systems play an important role in controlling their physical and chemical properties for subsequent applications. (Fe/Si) nanolayers were prepared by thermal evaporation under ultrahigh vacuum onto a Si(100) substrate. A morphological characterization of these films was performed by combination of scanning transmission electron microscopy (STEM) and X-ray reflectivity (XRR). The compositional depth profile of the (Fe/Si) structures was obtained by angle resolved X-ray photoelectron spectroscopy (ARXPS) and hard X-ray photoelectron spectroscopy (HAXPES). Moreover, determination of the stable phases formed at the Si on Fe interfaces was performed using conversion electron Mössbauer spectroscopy. The Si/Fe interface thickness and roughness were determined to be 1.4 nm and 0.6 nm, respectively. A large fraction of the interface is composed of c-Fe1-xSi paramagnetic phase, though a minoritary ferromagnetic Fe rich silicide phase is also present.
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Доп.точки доступа:
Badía-Romano, L.; Rubin, J.; Bartolomé, F.; Bartolome, J.; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Varnakov, S.N.; Варнаков, Сергей Николаевич; Magen, C.; Rubio-Zuazo, J.; Castro, G. R.