Рубрики:
VACUUM-ARC
PLASMACHEMICAL SYNTHESIS
THIN-FILM
DEPOSITION
Кл.слова (ненормированные):
Copper oxide nanoparticles -- Low pressure arc discharge -- Plasma-chemical synthesis -- Paschen curve -- Similarity parameter
VACUUM-ARC
PLASMACHEMICAL SYNTHESIS
THIN-FILM
DEPOSITION
Кл.слова (ненормированные):
Copper oxide nanoparticles -- Low pressure arc discharge -- Plasma-chemical synthesis -- Paschen curve -- Similarity parameter
Аннотация: The influence of a pressure of gas mixture (10 vol% O2 + 90% N2) on an average size of copper oxide nanoparticles, produced in the plasma of low pressure arc discharge, has been studied as a basic process variable. A correlation between the dependence of average particle size on gas mixture pressure and the dependence of discharge gap voltage on product of interelectrode distance by a gas mixture pressure, has been found. The estimation was carried out by means of X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM). A mathematical model of the cathode region, which shows the applicability of the similarity theory to the low pressure arc discharge, has been represented.
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Держатели документа:
Russian Acad Sci, Siberian Branch, Krasnoyarsk Sci Ctr, Krasnoyarsk 660036, Russia.
Siberian Fed Univ, Krasnoyarsk 660041, Russia.
Russian Acad Sci, Kirensky Inst Phys, Krasnoyarsk 660036, Russia.
Доп.точки доступа:
Uschakov, A. V.; Karpov, I. V.; Lepeshev, A. A.; Petrov, M. I.; Петров, Михаил Иванович; Russian Science Foundation [16-19-10054]