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Общее количество найденных документов : 25
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 1-20    21-25 
1.

A study of the effect of synchrotron radiation exposure on the thermophysical parameters of the PMMA X-ray resist/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2012. - Vol. 6, Is. 1.-С.12-18
2.

Beryllium X-ray lithography templates/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2015. - Vol. 9, Is. 1.-С.53-61
3.

Equipment for soft X-Ray lithography on the VEPP-4M/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2013. - Vol. 7, Is. 4.-С.691-696
4.

Erratum: Status of the Siberian Synchrotron Radiation Center (Nuclear Instruments and Methods in Physics Research A (2005) 543 (1) DOI: 10.1016/j.nima.2005.01.021)/A. I. Ancharov [et al.] // Nuclear Instruments and Methods in Physics Research. Sec. A, 2006. - Vol. 556, Is. 2.-С.645
5.

Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2017. - Vol. 11, Is. 4.-С.710-720
6.

Fabrication of x-ray masks on a thick substrate for deep x-ray lithography/E. V. Petrova [et al.] // Journal of Surface Investigation, 2007. - Vol. 1, Is. 3.-С.307-311
7.

Formation of Thick High-Aspect-Ratio Resistive Masks by the Contact Photolithography Method/A. N. Gentselev [et al.] // Optoelectronics, Instrumentation and Data Processing, 2018. - Vol. 54, Is. 2.-С.127-134
8.

Frequency Filters and Planar Lenses for the Terahertz Band: Configurations with Low- and High-Aspect Microstructures/S. A. Kuznetsov [et al.] // IRMMW-THz 2015 : 40th International Conference on Infrared, Millimeter, and Terahertz waves, Hong Kong, 23 - 28 August 2015. -Piscataway:IEEE, 2015.- Art.nr 7327727
9.

Functional devices of THz photonics based on plasmonic metasurfaces/S. A. Kuznetsov, V. N. Fedorinin, A. V. Gelfand [et al.] // The 4-th International Conference Terahertz and Microwave Radiation: Generation, Detection and Applications (TERA-2020), Tomsk, 24-26 August 2020 : Abstracts. -Tomsk:IAO SB RAS, 2020.-С.24
10.

Gentselev A.N. Methods of manufacturing self-supporting X-ray templates/A. N. Gentselev, S. G. Baev // Applied Physics, 2022, Is. 1.-С.75-82
11.

Gentselev A.N. Production of Planar Elements of Terahertz Optics by Means of Deep X-Ray Lithography/A. N. Gentselev, S. G. Baev // Optoelectronics, Instrumentation and Data Processing, 2022. - Vol. 58, Is. 2.-С.198-205
12.

Gentselev A.N. X-ray masks based on epoxygraphite/A. N. Gentselev, A. G. Zelinsky, V. I. Kondratyev // Journal of Surface Investigation, 2013. - Vol. 7, Is. 6.-С.1261-1269
13.

Gentselev A.N. X-ray masks with multi-layer holding membrane/A. N. Gentselev, B. G. Goldenberg, A. G. Lemzyakov // Applied Physics, 2020, Is. 5.-С.109-115
14.

Gerasimov V.V. Subwavelength metal gratings for THz gas sensing/V. V. Gerasimov, O. E. Kameshkov, A. N. Gentselev // 46th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz), Chengdu, China, 28 August - 3 September 2021. -Chengdu:University of Electronic Science and Technology of China, 2021.-С.232
15.

Graphite foil as the supporting membrane of LIGA masks/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2011. - Vol. 5, Is. 4.-С.725-729
16.

Implementation of Terahertz High-Pass Filters Based on All-Metal Microstructures using Deep X-ray Lithography/A. N. Gentselev [et al.] // Optoelectronics, Instrumentation and Data Processing, 2019. - Vol. 55, Is. 2.-С.115-125
17.

Kuznetsov S.A. Implementation of high-pass subterahertz filters using high-aspect-ratio polimeric structures/S. A. Kuznetsov, A. N. Gentselev, S. G. Baev // Optoelectronics, Instrumentation and Data Processing, 2017. - Vol. 53, Is. 1.-С.88-95
18.

Manufacturing of Self-bearing Microstructures of the Pseudo-metallic Type for Diffraction Experiments in the Terahertz Range/B. G. Goldenberg [et al.] // Physics Procedia, 2016. - Vol. 84:Proceedings of the International Conference "Synchrotron and Free electron laser Radiation: generation and application" (SFR-2016), July 4 - 7, 2016, Novosibirsk, Russia.-С.165-169
19.

Method for Manufacturing Silicon X-Ray Masks Via Plasma Chemical Etching/A. N. Gentselev, F. N. Dultsev, B. G. Goldenberg, K. E. Kuper // Journal of Surface Investigation, 2020. - Vol. 14, Is. 4.-С.862-865
20.

Method for the Fabrication of Biochips/A. N. Gentselev, F. N. Dultsev, A. V. Varand, V. I. Kondratyev // Journal of Surface Investigation, 2020. - Vol. 14, Is. 6.-С.1403-1409
 1-20    21-25 
 
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