Поисковый запрос: (<.>A=Gentselev, A. N.$<.>) |
Общее количество найденных документов : 25
Показаны документы с 1 по 20 |
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1.
| X-ray lithography at the VEPP-3 storage ring/L. D. Artamonova, A. N. Gentselev, G. A. Deis [et al.] // Review of Scientific Instruments, 1992. - Vol. 63, Is. 1.-С.764-766
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2.
| The wiggler based modernization of LIGA-station at the VEPP-3 storage ring/V. N. Korchuganov [et al.] // The 6th International conference on synchrotron radiation instrumentation : SRI'97, Himeji, Japan, 4-8 August 1997 : abstracts, 1997, N. 7L05.-С.215
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3.
| Status of the Siberian synchrotron radiation center/A. I. Ancharov [et al.] // Nuclear Instruments and Methods in Physics Research. Sec. A, 2005. - Vol. 543, Is. 1:Proceedings of the XV International Synchrotron Radiation Conference SR 2004, Novosibirsk, Russia, 19–23 July 2004.-С.1-13
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4.
| VUV and soft X-ray metrology stations at the International Siberian Synchrotron Radiation centre/V. I. Buhtiyarov [et al.] // NEWRAD 2005 : proceedings of the 9th International conference on New Developments and Applications in Optical Radiometry, 17-19 October, 2005, Davos, Switzerland. -Davos:Physikalisch-Meteorologisches Observatorium Davos, Weltstrahlungszentrum, 2005.-С.33
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5.
| Erratum: Status of the Siberian Synchrotron Radiation Center (Nuclear Instruments and Methods in Physics Research A (2005) 543 (1) DOI: 10.1016/j.nima.2005.01.021)/A. I. Ancharov [et al.] // Nuclear Instruments and Methods in Physics Research. Sec. A, 2006. - Vol. 556, Is. 2.-С.645
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6.
| Fabrication of x-ray masks on a thick substrate for deep x-ray lithography/E. V. Petrova [et al.] // Journal of Surface Investigation, 2007. - Vol. 1, Is. 3.-С.307-311
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7.
| Graphite foil as the supporting membrane of LIGA masks/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2011. - Vol. 5, Is. 4.-С.725-729
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8.
| A study of the effect of synchrotron radiation exposure on the thermophysical parameters of the PMMA X-ray resist/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2012. - Vol. 6, Is. 1.-С.12-18
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9.
| Gentselev A.N. X-ray masks based on epoxygraphite/A. N. Gentselev, A. G. Zelinsky, V. I. Kondratyev // Journal of Surface Investigation, 2013. - Vol. 7, Is. 6.-С.1261-1269
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10.
| Equipment for soft X-Ray lithography on the VEPP-4M/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2013. - Vol. 7, Is. 4.-С.691-696
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11.
| Beryllium X-ray lithography templates/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2015. - Vol. 9, Is. 1.-С.53-61
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12.
| Frequency Filters and Planar Lenses for the Terahertz Band: Configurations with Low- and High-Aspect Microstructures/S. A. Kuznetsov [et al.] // IRMMW-THz 2015 : 40th International Conference on Infrared, Millimeter, and Terahertz waves, Hong Kong, 23 - 28 August 2015. -Piscataway:IEEE, 2015.- Art.nr 7327727
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13.
| Manufacturing of Self-bearing Microstructures of the Pseudo-metallic Type for Diffraction Experiments in the Terahertz Range/B. G. Goldenberg [et al.] // Physics Procedia, 2016. - Vol. 84:Proceedings of the International Conference "Synchrotron and Free electron laser Radiation: generation and application" (SFR-2016), July 4 - 7, 2016, Novosibirsk, Russia.-С.165-169
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14.
| Kuznetsov S.A. Implementation of high-pass subterahertz filters using high-aspect-ratio polimeric structures/S. A. Kuznetsov, A. N. Gentselev, S. G. Baev // Optoelectronics, Instrumentation and Data Processing, 2017. - Vol. 53, Is. 1.-С.88-95
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15.
| Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography/A. N. Gentselev [et al.] // Journal of Surface Investigation, 2017. - Vol. 11, Is. 4.-С.710-720
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16.
| Formation of Thick High-Aspect-Ratio Resistive Masks by the Contact Photolithography Method/A. N. Gentselev [et al.] // Optoelectronics, Instrumentation and Data Processing, 2018. - Vol. 54, Is. 2.-С.127-134
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17.
| Implementation of Terahertz High-Pass Filters Based on All-Metal Microstructures using Deep X-ray Lithography/A. N. Gentselev [et al.] // Optoelectronics, Instrumentation and Data Processing, 2019. - Vol. 55, Is. 2.-С.115-125
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18.
| Gentselev A.N. X-ray masks with multi-layer holding membrane/A. N. Gentselev, B. G. Goldenberg, A. G. Lemzyakov // Applied Physics, 2020, Is. 5.-С.109-115
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19.
| Method for the Fabrication of Biochips/A. N. Gentselev, F. N. Dultsev, A. V. Varand, V. I. Kondratyev // Journal of Surface Investigation, 2020. - Vol. 14, Is. 6.-С.1403-1409
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20.
| Method for Manufacturing Silicon X-Ray Masks Via Plasma Chemical Etching/A. N. Gentselev, F. N. Dultsev, B. G. Goldenberg, K. E. Kuper // Journal of Surface Investigation, 2020. - Vol. 14, Is. 4.-С.862-865
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