Библиотека института физики им. Л.В. Киренского СО РАН

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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Badía-Romano L., Rubin J., Bartolomé F., Magen C., Bartolome J., Varnakov S. N., Ovchinnikov S. G., Rubio-Zuazo J., Castro G.R.
Заглавие : Morphology of the asymmetric iron-silicon interfaces
Место публикации : J. Alloys Compd.: Elsevier Science, 2015. - Vol. 627. - P.136-145. - ISSN 0925, DOI 10.1016/j.jallcom.2014.12.019. - ISSN 18734669(eISSN)
Примечания : Cited References:69. - The financial support of the Spanish MINECO MAT2011-23791, the Presidentof Russia Grant (NSh-1044.2012.2), RFFI Grant 13-02-01265, the Ministryof Education and Science of Russian Federation (14.604.21.0002 and02G25.31.0043), Aragonese DGA-IMANA E34 (cofunded by Fondo SocialEuropeo) and that received from the European Union FEDER funds isacknowledged. L.B.R. acknowledges the Spanish MINECO FPU 2010 grant.
Предметные рубрики: RAY PHOTOELECTRON-SPECTROSCOPY
ELECTRON MOSSBAUER-SPECTROSCOPY
Ключевые слова (''Своб.индексиров.''): fe/si nanolayers--interfaces--fe silicides--compositional depth--haxpes--cems
Аннотация: A systematic study of the iron–silicon interfaces formed upon preparation of (Fe/Si) multilayers has been performed by combination of modern and powerful techniques. Samples were prepared by thermal evaporation under ultrahigh vacuum onto a Si(1 0 0) substrate. The morphology of these films and their interfaces was studied by a combination of scanning transmission electron microscopy, X-ray reflectivity, angle resolved X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The Si-on-Fe interface thickness and roughness were determined to be 1.4(1) nm and 0.6(1) nm, respectively. Moreover, determination of the stable phases formed at both Fe-on-Si and Si-on-Fe interfaces was performed using conversion electron Mössbauer spectroscopy on multilayers with well separated Si-on-Fe and Fe-on-Si interfaces. It is shown that while a fraction of Fe remains as α-Fe, the rest has reacted with Si, forming the paramagnetic c-Fe1−xSi phase and a ferromagnetic Fe rich silicide (DO3 type phase). We conclude that the paramagnetic c-Fe1−xSi silicide sublayer is identical in both Si-on-Fe and Fe-on-Si interfaces, whereas an asymmetry is revealed in the composition of the ferromagnetic silicide sublayer.
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