1. 
|
Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Volochaev M. N., Tarasov I. A., Loginov Yu. Yu., Cherkov A. G., Kovalev I. V.
Заглавие : The regularities of phase formation in Fe3Si(111)/Si(111) structure at vacuum annealing
Коллективы : International Conference on Films and Coatings
Место публикации : J. Phys. Conf. Ser.: IOP, 2017. - Vol. 857, Is. 1. - Ст.012053. - ISSN 17426588 (ISSN), DOI 10.1088/1742-6596/857/1/012053
Примечания : Cited References: 10
Ключевые слова (''Своб.индексиров.''): coatings--high resolution transmission electron microscopy--molecular beam epitaxy--silicon--transmission electron microscopy--phase formations--polycrystalline--polycrystalline film--si(111) substrate--vacuum-annealing--annealing
Аннотация: The regularities of phase formation and thermal stability in Fe3Si(111)/Si(111) structure at stepped vacuum annealing (350, 450 and 550 °C) were investigated. The layer of 32 nm Fe3Si was deposited onto Si(111) substrate by molecular beam epitaxy at 260 °C. Transmission electron microscopy (TEM) measurements demonstrated that the film thickness increases by ∼19 % at 350 °C annealing without changing the phase composition. The polycrystalline -FeSi sublayer was formed on the interface at 450 °C annealing. Further annealing at 550 °C led to the ∼ 80 nm polycrystalline film formation containing the crystallites of -FeSi, Fe5Si3, and β-FeSi2 phases.
Смотреть статью,
Scopus,
WOS,
Читать в сети ИФ
Найти похожие
|
Главная
Каталог книг и брошюр библиотеки ИФ СО РАН