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Вид документа : Статья из журнала Шифр издания :
Автор(ы) : Varnakov S. N., Gomoyunova M. V., Grebenyuk G. S., Zabluda V. N., Ovchinnikov S. G., Pronin I. I.
Заглавие : Initial growth stages of manganese films on the Si(100)2 x 1 surface
Коллективы :
Russian-German Laboratory at HZB BESSY; Ministry of Education and Science of the Russian Federation [14V37.21.1276]; Russian Foundation for Basic Research [13-02-00398, 13-02-01265]
Место публикации : Phys. Solid State: MAIK Nauka-Interperiodica / Springer, 2014. - Vol. 56, Is. 2. - P.380-384. - ISSN 1063-7834, DOI 10.1134/S1063783414020310. - ISSN 1090-6460 Примечания : Cited References: 20. - This study was supported by the Russian-German Laboratory at HZB BESSY, the Ministry of Education and Science of the Russian Federation (agreement 14V37.21.1276), and the Russian Foundation for Basic Research (project nos. 13-02-00398 and 13-02-01265).
Предметные рубрики: PHOTOELECTRON-SPECTROSCOPY ROOM-TEMPERATURE SILICIDES SILICON Аннотация: Initial growth stages of manganese films on the Si(100)2 × 1 surface at room temperature have been investigated using high-energy-resolution photoelectron spectroscopy, and the dynamics of the variation in their phase composition and electronic structure with the coverage growth has been revealed. It has been shown that the interfacial manganese silicide and the film of the solid solution of silicon in manganese are sequentially formed under these conditions on the silicon surface. The growth of the metal manganese film starts after the deposition of ~0.9 nm Mn. Segregation of silicon on the film surface is observed in the range of coverages up to 1.6 nm Mn.
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