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Вид документа : Статья из журнала Шифр издания :
Автор(ы) : Uschakov A. V., Karpov I. V., Lepeshev A. A., Petrov M. I.
Заглавие : Plasma-chemical synthesis of copper oxide nanoparticles in a low-pressure arc discharge
Коллективы :
Russian Science Foundation [16-19-10054]
Место публикации : Vacuum: pergamon-Elsevier Science, 2016. - Vol. 133. - P.25-30. - ISSN 0042-207X, DOI 10.1016/j.vacuum.2016.08.007 Примечания : Cited References:36. - The work was performed with a support of the grant of the Russian Science Foundation (Project No. 16-19-10054)
Предметные рубрики: VACUUM-ARC PLASMACHEMICAL SYNTHESIS THIN-FILM DEPOSITION Ключевые слова (''Своб.индексиров.''): copper oxide nanoparticles--low pressure arc discharge--plasma-chemical synthesis--paschen curve--similarity parameter Аннотация: The influence of a pressure of gas mixture (10 vol% O2 + 90% N2) on an average size of copper oxide nanoparticles, produced in the plasma of low pressure arc discharge, has been studied as a basic process variable. A correlation between the dependence of average particle size on gas mixture pressure and the dependence of discharge gap voltage on product of interelectrode distance by a gas mixture pressure, has been found. The estimation was carried out by means of X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM). A mathematical model of the cathode region, which shows the applicability of the similarity theory to the low pressure arc discharge, has been represented.
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