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полныйинформационныйкраткий
Поисковый запрос: (<.>K=Fe/Si nanolayers<.>)
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    Morphology of the asymmetric iron-silicon interfaces / L. Badia-Romano [et al.] // J. Alloys Compd. - 2015. - Vol. 627. - P. 136-145, DOI 10.1016/j.jallcom.2014.12.019. - Cited References:69. - The financial support of the Spanish MINECO MAT2011-23791, the Presidentof Russia Grant (NSh-1044.2012.2), RFFI Grant 13-02-01265, the Ministryof Education and Science of Russian Federation (14.604.21.0002 and02G25.31.0043), Aragonese DGA-IMANA E34 (cofunded by Fondo SocialEuropeo) and that received from the European Union FEDER funds isacknowledged. L.B.R. acknowledges the Spanish MINECO FPU 2010 grant. . - ISSN 0925. - ISSN 1873-4669. -
РУБ Chemistry, Physical + Materials Science, Multidisciplinary + Metallurgy &
Рубрики:
RAY PHOTOELECTRON-SPECTROSCOPY
   ELECTRON MOSSBAUER-SPECTROSCOPY

Кл.слова (ненормированные):
Fe/Si nanolayers -- Interfaces -- Fe silicides -- Compositional depth -- HAXPES -- CEMS
Аннотация: A systematic study of the iron–silicon interfaces formed upon preparation of (Fe/Si) multilayers has been performed by combination of modern and powerful techniques. Samples were prepared by thermal evaporation under ultrahigh vacuum onto a Si(1 0 0) substrate. The morphology of these films and their interfaces was studied by a combination of scanning transmission electron microscopy, X-ray reflectivity, angle resolved X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The Si-on-Fe interface thickness and roughness were determined to be 1.4(1) nm and 0.6(1) nm, respectively. Moreover, determination of the stable phases formed at both Fe-on-Si and Si-on-Fe interfaces was performed using conversion electron Mössbauer spectroscopy on multilayers with well separated Si-on-Fe and Fe-on-Si interfaces. It is shown that while a fraction of Fe remains as α-Fe, the rest has reacted with Si, forming the paramagnetic c-Fe1−xSi phase and a ferromagnetic Fe rich silicide (DO3 type phase). We conclude that the paramagnetic c-Fe1−xSi silicide sublayer is identical in both Si-on-Fe and Fe-on-Si interfaces, whereas an asymmetry is revealed in the composition of the ferromagnetic silicide sublayer.

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Держатели документа:
Univ Zaragoza, CSIC, Inst Ciencia Mat Aragon, E-50009 Zaragoza, Spain
Univ Zaragoza, Dept Fis Mat Condensada, E-50009 Zaragoza, Spain
Univ Zaragoza, Dept Ciencia Mat & Ingn Met, E-50018 Zaragoza, Spain
Univ Zaragoza, INA, LMA, E-50018 Zaragoza, Spain
Fdn ARAID, E-50004 Zaragoza, Spain
Russian Acad Sci, Kirensky Inst Phys, Siberian Div, Krasnoyarsk 660036, Russia
Siberian Aerosp Univ, Krasnoyarsk 660014, Russia
ESRF, SpLine Spanish CRG, F-38043 Grenoble, France
CSIC, Inst Ciencia Mat Madrid, Madrid, Spain

Доп.точки доступа:
Badía-Romano, L.; Rubin, J.; Bartolomé, F.; Magen, C.; Bartolome, J.; Varnakov, S. N.; Варнаков, Сергей Николаевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Rubio-Zuazo, J.; Castro, G.R.
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