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    Study of morphology, magnetic properties, and visible magnetic circular dichroism of Ni nanoparticles synthesized in SiO2 by ion implantation / I. S. Edelman [et al.] // Physical Review B - Condensed Matter and Materials Physics. - 2013. - Vol. 87, Is. 11. - Ст. 115435. - P. , DOI 10.1103/PhysRevB.87.115435 . - ISSN 1098-0121
   Перевод заглавия: Изучение морфологии, магнитных свойств и магнитного кругового дихроизма в видимой области в наночастицах Ni, синтезированных в SiO2 с помощью ионной имплантации
Аннотация: A systematic study of ensembles of nickel nanoparticles fabricated by Ni+-ion implantation at a dose of (0.5-1.0)?1017 ions/cm2 in a thin near-surface layer of an amorphous SiO2 matrix by means of transmission electron microscopy (TEM), dc magnetic measurements, and magneto-optical technique is presented. TEM characterization of Ni nanoparticles proves the formation of isolated spherical nickel nanoparticles with diameters from 2 to 16 nm. The crystal structure and lattice constant of the nanoparticles correspond to face-centered-cubic Ni. The larger size nanoparticles are shown to have core-shell structure, which is unusual for the implantation conditions used. The shell of these nanoparticles consists of Ni, while the core has supposedly the composition coinciding with the matrix, i.e., SiO2. The core-shell nanoparticles in the investigated sample coexist with ordinary pure Ni nanoparticles, which strongly affects the magnetic and especially magneto-optic properties of the samples. For all three doses, the nanoparticles are in the superparamagnetic state at room temperature passing to the "frozen" state at lower temperatures. However, only the sample implanted with the lowest dose demonstrates the classic superparamagnetic behavior according to the shape of the experimental magnetization temperature dependencies for the zero-field-cooled (ZFC) and field-cooled regimes. This shape deviation from that characteristic of the pure superparamagnetic ensembles is ascribed mainly to the particle core-shell structure. The Ni nanoparticles' anisotropy constant estimated with the help of ZFC curves appears to exceed the bulk Ni anisotropy second constant approximately by two orders of magnitude. Magnetic circular dichroism (MCD) is characterized by spectral dependence modified strongly as compared to the MCD spectra of a continuous Ni film. In the spectral range 1.1-4.2 eV, the MCD spectrum consists of two broad maxima of opposite sign with the characteristics depending on the implantation dose and the measurement temperature. The MCD spectra analysis allows one to show that the higher-energy maximum (at 3.34-3.48 eV depending on the dose) is related to the surface plasmon resonance (SPR) excitation in pure Ni nanoparticles, while the lower-energy maximum (at 2.19-2.73 eV depending on the dose) should be associated with the SPR excitation in core-shell nanoparticles. В© 2013 American Physical Society.

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Держатели документа:
Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
Siberian Fed Univ, Krasnoyarsk 660041, Russia
Russian Acad Sci, Zavoisky Phys Tech Inst, Kazan 420029, Russia
Kazan Fed Univ, Kazan 420000, Russia

Доп.точки доступа:
Edelman, I. S.; Эдельман, Ирина Самсоновна; Petrov, D. A.; Петров, Дмитрий Анатольевич; Ivantsov, R. D.; Иванцов, Руслан Дмитриевич; Zharkov, S. M.; Жарков, Сергей Михайлович; Velikanov, D. A.; Великанов, Дмитрий Анатольевич; Gumarov, G. G.; Nuzhdin, V. I.; Valeev, V. F.; Stepanov, A. L.
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Petrov, D. A.
Study of morphology, magnetic properties, and visible magnetic circular dichroism of Ni nanoparticles synthesized in SiO2 by ion implantation / D. A. Petrov // The 7th Russian-French workshop on Nanosciences and Nanotechnologies : Program and abstract book / ed. A. V. Okotrub. - Novosibirsk, 2013. - P. 67 . - ISBN 978-5-901688-29-8

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Доп.точки доступа:
Okotrub, A.V. \ed.\; Петров, Дмитрий Анатольевич; Russian-French workshop on Nanosciences and Nanotechnologies(7 ; 2013 ; Jun. ; 3-6 ; Новосибирск); Российская академия наукСибирское отделение РАН; Институт неорганической химии им. А.В. Николаева Сибирского отделения РАН; Институт катализа им. Г.К. Борескова Сибирского отделения РАН; Институт физики полупроводников им. А.В. Ржанова Сибирского отделения РАН
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Microstructure and Magnetooptics of Silicon Oxide with Implanted Nickel Nanoparticles / I. S. Edel'man [et al.] // J. Exp. Theor. Phys. - 2011. - Vol. 113, Is. 6. - P. 1040-1049, DOI 10.1134/S1063776111160035. - Cited References: 44. - This work was supported by the Russian Foundation for Basic Research (project nos. 11-02-00972, 11-02-90420, 11-02-91341) and the program Research and Scientific-Pedagogical Brainpower of Innovated Russia (State contract 02.740.11.0797). . - ISSN 1063-7761

РУБ Physics, Multidisciplinary
Рубрики:
SIMPLE METAL-CLUSTERS
   OPTICAL-PROPERTIES
   ION-IMPLANTATION
   FARADAY-ROTATION
   KERR SPECTRA
   GLASS
   RESONANCE
   PHYSICS
   ENERGY
   FE
Кл.слова (ненормированные):
Disperse structure -- Effective medium model -- Implanted samples -- Irradiation dose -- Magnetic circular dichroisms -- Magnetic Nickel -- Magneto-optical Faraday effect -- Magneto-optical measurements -- matrix -- Metal nanoparticles -- Metallic nickel -- Nickel nanoparticles -- Nickel particles -- Optical range -- Spectral dependences -- Surface plasma resonances -- Tensor components -- Thin near-surface layers -- Amorphous silicon -- Crystal microstructure -- Dichroism -- Faraday effect -- Ion implantation -- Magnetoplasma -- Metallic compounds -- Nanomagnetics -- Nanoparticles -- Nickel -- Silicon compounds -- Silicon oxides -- Spectroscopy -- Tensors -- Transmission electron microscopy -- Nickel oxide
Аннотация: Metallic nickel nanoparticles of various sizes are formed in a thin near-surface layer in an amorphous SiO2 matrix during 40-keV Ni+ ion implantation at a dose of (0.25-1.0) x 10(17) ions/cm(2). The micro-structure of the irradiated layer and the crystal structure, morphology, and sizes of nickel particles formed at various irradiation doses are studied by transmission electron microscopy and electron diffraction. The magnetooptical Faraday effect and the magnetic circular dichroism in an ensemble of nickel nanoparticles are studied in the optical range. The permittivity (epsilon) over cap tensor components are calculated for the implanted samples using an effective medium model with allowance for the results of magnetooptical measurements. The spectral dependences of the tensor (epsilon) over cap components are found to be strongly different from those of a continuous metallic nickel film. These differences are related to a disperse structure of the magnetic nickel phase and to a surface plasma resonance in the metal nanoparticles.

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Держатели документа:
[Edel'man, I. S.
Petrov, D. A.
Ivantsov, R. D.
Zharkov, S. M.] Russian Acad Sci, LV Kirensky Phys Inst, Siberian Branch, Krasnoyarsk 660036, Russia
[Zharkov, S. M.] Siberian Fed Univ, Krasnoyarsk 660041, Russia
[Khaibullin, R. I.
Valeev, V. F.
Nuzhdin, V. I.
Stepanov, A. L.] Russian Acad Sci, Zavoisky Phys Tech Inst, Kazan 420029, Russia
[Stepanov, A. L.] Kazan Volga Reg Fed Univ, Kazan 420018, Russia
ИФ СО РАН
Kirensky Institute of Physics, Russian Academy of Sciences, Siberian Branch, Akademgorodok, Krasnoyarsk, 660036, Russian Federation
Siberian Federal University, Svobodnyi pr. 79, Krasnoyarsk, 660041, Russian Federation
Zavoisky Physical-Technical Institute, Russian Academy of Sciences, Sibirskii trakt 10/7, Kazan, 420029, Russian Federation
Kazan (Volga Region), Federal University, ul. Kremlevskaya 18, Kazan, 420018, Russian Federation

Доп.точки доступа:
Edel'man, I. S.; Edelman, I. S.; Petrov, D. A.; Петров, Дмитрий Анатольевич; Ivantsov, R. D.; Иванцов, Руслан Дмитриевич; Zharkov, S. M.; Жарков, Сергей Михайлович; Khaibullin, R. I.; Valeev, V. F.; Nuzhdin, V. I.; Stepanov, A. L.
}
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Admittance spectroscopy of dopants implanted in silicon and impurity state-induced AC magnetoresistance effect / D. A. Smolyakov, A. S. Tarasov, M. A. Bondarev [et al.] // Mater. Sci. Semicond. Process. - 2021. - Vol. 126. - Ст. 105663, DOI 10.1016/j.mssp.2021.105663. - Cited References: 21. - This study was supported by the Government of the Russian Federation , Mega Grant for the Creation of Competitive World-Class Laboratories (Agreement no. 075-15-2019-1886) . - ISSN 1369-8001
Кл.слова (ненормированные):
Semiconductors -- Magnetoimpedance -- Impurities -- Implantation
Аннотация: A silicon structure doped with Ga using ion implantation has been investigated by admittance spectroscopy. It has been established that the presence of the Ga impurity, along with the B one, in the silicon structure leads to the appearance of the second peak in the temperature dependence of the real part of the impedance (admittance). Moreover, switching-on a magnetic field parallel to the sample plane shifts the singularities in the temperature curve to the high-temperature region. This results in the manifestation of both the positive and negative magnetoresistance effect upon temperature and magnetic field variation. It has been found by the standard admittance spectroscopy analysis of the impedance data that the energy structure of the investigated sample includes two interfacial energy levels ES1(0) = 42 meV and ES2(0) = 69.4 meV. As expected, these energies are consistent with the energies of B and Ga dopants. In a magnetic field, these levels increase by 3 meV for B and 2 meV for Ga, which induces the magnetoresistance effect. It has been demonstrated that the interfacial state-induced magnetoresistance effect can be tuned by ion implantation and dopant selection.

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Держатели документа:
Kirensky Institute of Physics, Krasnoyarsk Scientific Center, Siberian Branch, Russian Academy of Sciences660036, Russian Federation
Lobachevsky State University, Nizhny Novgorod603950, Russian Federation

Доп.точки доступа:
Smolyakov, D. A.; Смоляков, Дмитрий Александрович; Tarasov, A. S.; Тарасов, Антон Сергеевич; Bondarev, M. A.; Бондарев, Михаил Александрович; Nikolskaya, A. A.; Vasiliev, V. K.; Volochaev, M. N.; Волочаев, Михаил Николаевич; Volkov, N. V.; Волков, Никита Валентинович
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    Implanted gallium impurity detection in silicon by impedance spectroscopy / D. Tetelbaum, A. Nikolskaya, M. Dorokhin [et al.] // Mater. Lett. - 2022. - Vol. 308, Part B. - Ст. 131244, DOI 10.1016/j.matlet.2021.131244. - Cited References: 11. - This study was supported by the Russian Foundation for Basic Research (grant No. 20-42-243007), Ministry of Science and Higher Education of the Russian Federation (project No. 075-03-2020-191/5), as well as the Government of the Russian Federation within the framework of the Megagrant for the creation of world-class laboratories (No. 075-15-2019-1886) . - ISSN 0167-577X
   Перевод заглавия: Обнаружение имплантированной примеси галлия в кремнии методом импедансной спектроскопии
Кл.слова (ненормированные):
Silicon -- Ion implantation -- Impedance spectroscopy -- Energy levels -- Ion channeling
Аннотация: The results of determining the energy levels of boron-doped silicon implanted with gallium ions by impedance spectroscopy are reported. In the as-implanted sample the boron level remains the same and a second level appears close to the Ga-level reported in literature. In the sample annealed at 1000 °C, two levels are observed neither of which corresponds to the literature values for boron and gallium. It is assumed that in the as-implanted sample this method detects levels of gallium atoms located at a depth where ions penetrate due to the channeling effect, since a large concentration of defects at shallower depths does not allow detection of energy levels due to the Fermi level pinning. Explaining the results for the sample annealed after implantation requires additional research. The main result of this work is to establish the possibility of detecting impurity levels in ion-implanted silicon by impedance spectroscopy even in the absence of subsequent annealing.

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Держатели документа:
Research Institute of Physics and Technology, Lobachevsky University, 23/3 Gagarina Avenue, Nizhny Novgorod, 603022, Russian Federation
Kirensky Institute of Physics, 50 st. Akademgorodok, Krasnoyarsk, 660036, Russian Federation
Institute of Engineering Physics and Radio Electronics, Siberian Federal University, 79 Svobodny pr., Krasnoyarsk, 660041, Russian Federation

Доп.точки доступа:
Tetelbaum, D.; Nikolskaya, A.; Dorokhin, M.; Vasiliev, V.; Smolyakov, D. A.; Смоляков, Дмитрий Александрович; Lukyanenko, A. V.; Лукьяненко, Анна Витальевна; Baron, F. A.; Барон, Филипп Алексеевич; Tarasov, A. S.; Тарасов, Антон Сергеевич
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    FMR and TEM Studies of Co and Ni Nanoparticles Implanted in the SiO2 Matrix / I. S. Edelman [et al.] // Appl. Magn. Reson. - 2011. - Vol. 40, Is. 3. - P363-375, DOI 10.1007/s00723-011-0218-4. - Cited Reference Count: 51. - Гранты: The work was supported in part by the Russian Foundation for Basic Research, grant no. 11-02-00972-a, Ministry of Education and Science of the Russian Federation, Federal Target Program "Scientific and scientific-pedagogical personnel of innovative Russia'', contract no. 02.740.11.0797, and State Program "Development of the Scientific Potential of the Higher Education School'', project no. 2.1.1/6038. S.M. Zharkov acknowledges the financial support of the Russian government contract no. 02.740.11.0568. The electron microscopy investigations were carried out at the Joint Center of the Siberian Federal University. - Финансирующая организация: Russian Foundation for Basic Research [11-02-00972-a]; Ministry of Education and Science of the Russian Federation [02.740.11.0797]; State Program "Development of the Scientific Potential of the Higher Education School'' [2.1.1/6038]; Russian government [02.740.11.0568] . - MAY. - ISSN 0937-9347. - ISSN 1613-7507
Рубрики:
FERROMAGNETIC-RESONANCE
   MAGNETIC-PROPERTIES
   THIN-FILMS
   COBALT NANOPARTICLES
   ION-IMPLANTATION
   FINE PARTICLES
   GRANULAR FILMS
   ANISOTROPY
   POLYIMIDES
   RUTILE
Кл.слова (ненормированные):
energy dispersive x ray spectroscopy -- face-centered cubic structure -- fused silica plates -- g factors -- hexagonal close packing -- high dose -- high-dose implantation -- implantation dose -- implanted samples -- line shape -- magnetic parameters -- matrix -- metal nanoparticles -- ni nanoparticles -- nonsymmetric -- out-of-plane -- room temperature -- spherical shape -- subsurface layer -- tem -- temperature dependence -- thin magnetic films -- uniaxial magnetic anisotropy -- cobalt -- fused silica -- magnetic anisotropy -- nanoparticles -- silica -- silicon compounds -- transmission electron microscopy -- x ray spectroscopy -- ferromagnetic resonance
Аннотация: Fused silica plates have been implanted with 40 keV Co+ or Ni+ ions to high doses in the range of (0.25-1.0) x 10(17) ions/cm(2), and magnetic properties of the implanted samples have been studied with ferromagnetic resonance (FMR) technique supplemented by transmission electron microscopy, electron diffraction and energy dispersive X-ray spectroscopy. The high-dose implantation with 3d-ions results in the formation of cobalt and nickel metal nanoparticles in the irradiated subsurface layer of the SiO2 matrix. Co and Ni nanocrystals with hexagonal close packing and face-centered cubic structures have a spherical shape and the sizes of 4-5 nm (for cobalt) and 6-14 nm (for nickel) in diameter. Room-temperature FMR signals from ensembles of Co and Ni nanoparticles implanted in the SiO2 matrix exhibit an out-of-plane uniaxial magnetic anisotropy that is typical for thin magnetic films. The dose and temperature dependences of FMR spectra have been analyzed using the Kittel formalism, and the effective magnetization and g-factor values have been obtained for Co- and Ni-implanted samples. Nonsymmetric FMR line shapes have been fitted by a sum of two symmetrical curves. The dependences of the magnetic parameters of each curve on the implantation dose and temperature are presented.

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Держатели документа:
Siberian Fed Univ, Krasnoyarsk 660041, Russia
Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
Zavoisky Physical-Technical Institute,Russian Academy of Sciences

Доп.точки доступа:
Edelman, I. S.; Эдельман, Ирина Самсоновна; Petrakovskaja, E. A.; Петраковская, Элеонора Анатольевна; Petrov, D. A.; Петров, Дмитрий Анатольевич; Zharkov, S. M.; Жарков, Сергей Михайлович; Khaibullin, R. I.; Nuzhdin, V. I.; Stepanov, A. L.
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Magnetic resonance in planar assemblies of Ni and Co nanoparticles prepared in SiO2 with ion implantation [Text] / D. A. Petrov, I. S. Edelman [et al.] // IV Euro-Asian Symposium "Trends in MAGnetism" Nanospintronics (EASTMAG-2010). School for young scientist "Spintronics" : June 28 - Lule 2, 2010"Book of abstracts. - Ekaterinburg, 2010. - P. 198

РИНЦ

Доп.точки доступа:
Petrov, D.A.; Edelman, I.S.; Petrakovskaya, E.A.; Khaibullin, R.I.; Nugdin, V.I.; Stepanov, A.L.; Euro-Asian Symposium "Trends in MAGnetism"(4 ; 2010 ; Jun.-Jul. ; Ekaterinburg); "Trends in MAGnetism", Euro-Asian Symposium(4 ; 2010 ; Jun.-Jul. ; Ekaterinburg); Уральское отделение РАН
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Magnetic resonance in planar assemblies of Ni and Co nanoparticles preparedin SiO2 with ion implantation [Text] / D. A. Petrov, I. S. Edelman [et al.] // IV Euro-Asian Symposium "Trends in MAGnetism" Nanospintronics (EASTMAG-2010). School for young scientist "Spintronics" : June 28 - Lule 2, 2010"Book of abstracts. - Ekaterinburg, 2010. - P. 198

РИНЦ

Доп.точки доступа:
Petrov, D.A.; Edelman, I.S.; Petrakovskaya, E.A.; Khaibullin, R.I.; Nugdin, V.I.; Stepanov, A.L.; Euro-Asian Symposium "Trends in MAGnetism"(4 ; 2010 ; Jun.-Jul. ; Ekaterinburg); "Trends in MAGnetism", Euro-Asian Symposium(4 ; 2010 ; Jun.-Jul. ; Ekaterinburg); Уральское отделение РАН
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