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Magnetic and magnetooptical properties of nanothick polycrystalline Co-P films / A. V. Chzhan [et al.] // Bull. Russ. Acad. Sci.: Phys. - 2012. - Vol. 76, Is. 2. - P. 180-182, DOI 10.3103/S106287381202027X. - Cited References: 9 . - ISSN 1062-8738
Кл.слова (ненормированные):
Co films -- Film surface morphology -- Magnetic and magneto-optical properties -- Magnetic polarizations -- Magneto-optical Faraday effect -- Polycrystalline -- Specific values -- Underlayers -- Faraday effect -- Metallic films -- Phosphorus -- Cobalt
Аннотация: Features of the formation of chemically deposited polycrystalline Co-P films with nanometer thicknesses are established by magnetic measurements and analysis of film surface morphology. It is found that the specific value of the magnetooptical Faraday effect in Co-P films exceeds that in Co films by a factor of more than two. This is attributed to the magnetic polarization of a Pd underlayer. It is shown the Kerr effect in Co films is negligibly influenced by the embedding of phosphorus. © 2012 Allerton Press, Inc.

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Публикация на русском языке Магнитные и магнитооптические свойства поликристаллических пленок Co–P в области нанотолщин // Известия РАН. Серия физическая. - 2012. - Т. 76, № 2. - С. 205-207. - ISSN 0367-6765

Держатели документа:
Kirensky Institute of Physics, Russian Academy of Sciences, Siberian Branch, Krasnoyarsk 660036, Russian Federation
Siberian Federal University, Krasnoyarsk 660041, Russian Federation

Доп.точки доступа:
Chzhan, A. V.; Чжан, Анатолий Владимирович; Patrin, G. S.; Патрин, Геннадий Семёнович; Kiparisov, S. Ya.; Кипарисов, Семен Яковлевич; Seredkin, V. A.; Середкин, Виталий Александрович; Pal'Chik, M. G.; Пальчик, Марина Геннадьевна; Burkova, L. V.; Буркова, Людмила Викторовна
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    Magnetic and magneto-optical properties of Co-P films prepared by chemical deposition / A. V. Chzhan [et al.] // J. Magn. Magn. Mater. - 2011. - Vol. 323, Is. 20. - P. 2493-2496, DOI 10.1016/j.jmmm.2011.05.024. - Cited Reference Count: 22. - Гранты: This study was supported by the Russian Foundation for Basic Research, Project no. 08-02-00397a and the departmental target program Development of Scientific Potential of Higher Education, 2009-2010, Project no. 2.1.1./4399. - Финансирующая организация: Russian Foundation for Basic Research [08-02-00397a]; departmental target program Development of Scientific Potential of Higher Education [2.1.1./4399] . - OCT. - ISSN 0304-8853
Рубрики:
SPECTROSCOPY
   THICKNESS
   COBALT
Кл.слова (ненормированные):
co-p films -- chemically deposition -- the polar kerr and faraday effects -- hysteresis loops -- chemically deposition -- cop films -- hysteresis loops -- the polar kerr and faraday effects -- chemical deposition -- chemically deposition -- co films -- cop films -- film magnetization -- film surface morphology -- incident light -- magnetic and magneto-optical properties -- magnetic layers -- polar kerr effect -- polar-kerr -- polycrystalline -- underlayers -- chemical analysis -- faraday effect -- hysteresis loops -- kerr magnetooptical effect -- light reflection -- magnetic materials -- optical kerr effect -- palladium -- cobalt
Аннотация: Features in the formation of chemically deposited polycrystalline Co-P films with thicknesses of a few nanometers are established by analyzing film surface morphology and variation in the film magnetization. It is shown that in the thickness range below 30 nm the polar Kerr effect value OK changes nonmonotonically and depends on a wavelength of the incident light. For the films thicker than 30 nm, this value depends weakly on both the thickness and the wavelength. These features in the OK behavior are attributed to the Faraday effect, which is revealed at small thicknesses upon light reflection from the lower surface of a magnetic layer. It is found that the Faraday effect in the Co-P films exceeds that in the Co films by a factor of more than two. This effect is assumed to be caused by the presence of a Pd underlayer in the samples under study. (C) 2011 Elsevier BY. All rights reserved.

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Держатели документа:
Russian Acad Sci, LV Kirensky Phys Inst, Siberian Branch, Krasnoyarsk 660036, Russia
Siberian Fed Univ, Krasnoyarsk 660041, Russia

Доп.точки доступа:
Chzhan, A. V.; Patrin, G. S.; Kiparisov, S. Y.; Seredkin, V. A.; Середкин, Виталий Александрович; Burkova, L. V.; Буркова, Людмила Викторовна; Velikanov, D. A.; Великанов, Дмитрий Анатольевич
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