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Reversible UV induced metal-semiconductor transition in In2O3 thin films prepared by autowave oxidation / I. A. Tambasov [et al.] // Semicond. Sci. Technol. - 2014. - Vol. 29, Is. 8. - Ст. 82001, DOI 10.1088/0268-1242/29/8/082001. - Cited References: 56. - This work was supported by the Federal Target Program through Contract No 14.513.11.0023; the Russian Foundation for Basic Research, Project No. 14-02-31156. . - ISSN 0268-1242. - ISSN 1361-6641

РУБ Engineering, Electrical & Electronic + Materials Science, Multidisciplinary + Physics, Condensed Matter
Рубрики:
TRANSPARENT CONDUCTING OXIDES
   Ga-DOPED ZnO
   LOW-TEMPERATURE
   HIGH-PERFORMANCE
   SUBSTRATE-TEMPERATURE
   INSULATOR-TRANSITION
   ROOM-TEMPERATURE
   TRANSISTORS
   COMBUSTION
   PHOTOREDUCTION
Кл.слова (ненормированные):
indium oxide thin films -- autowave oxidation -- metal-semiconductor transition -- UV irradiation -- photoreduction
Аннотация: We have prepared thin indium oxide films by the autowave oxidation reaction. Measurements of temperature dependence of resistivity, Hall carrier concentration and Hall mobility have been conducted in the temperature range 5-272 K. Before ultraviolet (UV) irradiation, the indium oxide film had a semiconductor-like temperature dependence of resistivity. and the ratio of rho (5 K)/rho(272 K) was very limited (similar to 1.2). It was found that after UV irradiation of the In2O3 film, the metal-semiconductor transition (MST) was observed at similar to 100 K. To show that this MST is reversible and repeatable, two full cycles of 'absence of MST-presence of MST' have been done using UV irradiation (photoreduction) as the induced mechanism and exposure to an oxygen environment as the reversible mechanism, respectively. MST in transparent conducting oxide (TCO) is possibly associated with the undoped structure of metal oxide, which has some disorder of oxygen vacancies. It was suggested that reversible UV induced metal-semiconductor transition would occur in other TCOs.

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Держатели документа:
Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
Reshetnev Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia
Russian Acad Sci, Siberian Branch, Krasnoyarsk Sci Ctr, Krasnoyarsk 660036, Russia

Доп.точки доступа:
Tambasov, I. A.; Тамбасов, Игорь Анатольевич; Myagkov, V. G.; Мягков, Виктор Григорьевич; Tarasov, A. S.; Тарасов, Антон Сергеевич; Ivanenko, A. A.; Иваненко, Александр Анатольевич; Bykova, L. E.; Быкова, Людмила Евгеньевна; Nemtsev, I. V.; Немцев, Иван Васильевич; Eremin, E. V.; Еремин, Евгений Владимирович; Yozhikova, E. V.; Federal Target Program [14.513.11.0023]; Russian Foundation for Basic Research [14-02-31156]
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