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Effect of alloy formation processes in the Co-Cu system on the magnetic and magnetoresistance properties of multilayer Co/Cu films with ultrathin Co layers prepared by DC magnetron sputtering / D. L. Khalyapin [et al.] // Phys. Solid State. - 2010. - Vol. 52, Is. 9. - P. 1787-1796, DOI 10.1134/S1063783410090015. - Cited References: 29
. - ISSN 1063-7834РУБ Physics, Condensed Matter
Рубрики:
GIANT MAGNETORESISTANCE
SIZE DISTRIBUTION
SPIN VALVES
EXCHANGE
TEMPERATURE
HYSTERESIS
ANISOTROPY
CU(001)
ISLANDS
Аннотация: This paper reports on a study of multilayer Co/Cu films with an effective thickness of the Co layer of similar to 3.5 , which were prepared by magnetron sputtering. The samples prepared have been found to have a metastable multiphase structure. An analysis of the data obtained by structural and, primarily, by magnetic methods has revealed that the main phases are the Co/Cu supersaturated solid solution (alloy) with a Co concentration of about 30 at %, the superparamagnetic phase, and the paramagnetic phase, which is accounted for by the presence of small (a few atoms at most) Co clusters embedded in the Cu matrix. A clearly pronounced maximum in the temperature dependences of the low-field magnetoresistance has been found, which is associated with the temperature of the magnetic phase transition of the supersaturated Co-Cu alloy.
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Держатели документа:
[Khalyapin, D. L.] Siberian Fed Univ, Krasnoyarsk 660041, Russia
[Khalyapin, D. L.
Kim, P. D.
Turpanov, I. A.
Beten'kova, A. Ya.
Bondarenko, G. V.
Isaeva, T. N.] Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
[Kim, J.] Hanyang Univ, Dept Met & Mat Sci, Ansan 426791, South Korea
[Kim, I.] Samsung Elect Mech Co LTD, Cent R&D Inst, EMD Lab, Suwon 443743, Gyunggi Do, South Korea
ИФ СО РАН
Siberian Federal University, pr. Svobodny 79, Krasnoyarsk 660041, Russian Federation
Kirensky Institute of Physics, Siberian Branch, Russian Academy of Sciences, Akademgorodok 50, Krasnoyarsk 660036, Russian Federation
Department of Metallurgical and Material Science, Hanyang University, Sa-3-dong 1271, Ansan 426-791, South Korea
EMD Laboratory, Central R and D Institute, Samsung Electro-Mechanics Co., LTD, 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, South Korea
Доп.точки доступа:
Khalyapin, D. L.; Kim, P. D.; Ким, Пётр Дементьевич; Kim, J.; Turpanov, I. A.; Турпанов, Игорь Александрович; Beten'kova, A. Ya.; Бетенькова, Анна Яковлевна; Bondarenko, G. V.; Бондаренко, Геннадий Васильевич; Isaeva, T. N.; Kim, I.
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