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Effect of exposure to optical radiation and temperature on the electrical and optical properties of In2O3 films produced by autowave oxidation / I. A. Tambasov [et al.] // Semiconductors. - 2014. - Vol. 48, Is. 2. - P. 207-211, DOI 10.1134/S1063782614020286. - Cited References: 42. - This study was supported by the Ministry of Education and Science of the Russian Federation, Federal Targeted Program "Research and Development in Priority Fields of Development of the Science and Technology Complex of Russia for 2007-2013", state contract no. 14.513.11.0023. . - ISSN 1063-7826. - ISSN 1090-6479

РУБ Physics, Condensed Matter
Рубрики:
GAS SENSOR RESPONSE
   INDIUM OXIDE-FILMS
   THIN-FILMS
   HIGH-PERFORMANCE
   TIN OXIDE
   TRANSPARENT CONDUCTORS
   SUBSTRATE-TEMPERATURE
   ROOM-TEMPERATURE
   TRANSISTORS
   PHOTOREDUCTION
Аннотация: Indium-oxide films are synthesized by the autowave-oxidation reaction. It is shown that, upon exposure to optical radiation, the resistance of the films sharply decreases and the maximal relative change in the resistance is 52% at room temperature. Two resistance relaxation rates after termination of the irradiation, 15 Omega s(-1) during the first 30 s and 7 Omega s(-1) over the remaining time, are determined. The data of infrared spectroscopy of the films show that exposure to optical radiation induces a 2.4% decrease in the transmittance at a wavelength of 6.3 mu m. It is found that, after termination of the irradiation, the transmittance gradually increases with a rate of 0.006% s(-1). It is suggested that photoreduction is the dominant mechanism responsible for changes in the electrical and optical properties of the In2O3 films.

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Публикация на русском языке Влияние фотооблучения и температуры на электрические и оптические свойства пленок In2O3, полученных автоволновым окислением [Текст] / И. А. Тамбасов [и др.] // Физ. и техника полупроводников : Санкт-Петербургская издательская фирма "Наука" РАН, 2014. - Т. 48 Вып. 2. - С. 220-224

Держатели документа:
Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
Siberian State Aerosp Univ, Krasnoyarsk 660037, Russia
Joint Stock Co Academician MF Reshetnev Informat, Zheleznogorsk 662972, Russia

Доп.точки доступа:
Tambasov, I. A.; Тамбасов, Игорь Анатольевич; Myagkov, V. G.; Мягков, Виктор Григорьевич; Ivanenko, A. A.; Иваненко, Александр Анатольевич; Bykova, L. E.; Быкова, Людмила Евгеньевна; Yozhikova, E. V.; Maksimov, I. A.; Ivanov, V. V.; Ministry of Education and Science of the Russian Federation [14.513.11.0023]
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Reversible UV induced metal-semiconductor transition in In2O3 thin films prepared by autowave oxidation / I. A. Tambasov [et al.] // Semicond. Sci. Technol. - 2014. - Vol. 29, Is. 8. - Ст. 82001, DOI 10.1088/0268-1242/29/8/082001. - Cited References: 56. - This work was supported by the Federal Target Program through Contract No 14.513.11.0023; the Russian Foundation for Basic Research, Project No. 14-02-31156. . - ISSN 0268-1242. - ISSN 1361-6641

РУБ Engineering, Electrical & Electronic + Materials Science, Multidisciplinary + Physics, Condensed Matter
Рубрики:
TRANSPARENT CONDUCTING OXIDES
   Ga-DOPED ZnO
   LOW-TEMPERATURE
   HIGH-PERFORMANCE
   SUBSTRATE-TEMPERATURE
   INSULATOR-TRANSITION
   ROOM-TEMPERATURE
   TRANSISTORS
   COMBUSTION
   PHOTOREDUCTION
Кл.слова (ненормированные):
indium oxide thin films -- autowave oxidation -- metal-semiconductor transition -- UV irradiation -- photoreduction
Аннотация: We have prepared thin indium oxide films by the autowave oxidation reaction. Measurements of temperature dependence of resistivity, Hall carrier concentration and Hall mobility have been conducted in the temperature range 5-272 K. Before ultraviolet (UV) irradiation, the indium oxide film had a semiconductor-like temperature dependence of resistivity. and the ratio of rho (5 K)/rho(272 K) was very limited (similar to 1.2). It was found that after UV irradiation of the In2O3 film, the metal-semiconductor transition (MST) was observed at similar to 100 K. To show that this MST is reversible and repeatable, two full cycles of 'absence of MST-presence of MST' have been done using UV irradiation (photoreduction) as the induced mechanism and exposure to an oxygen environment as the reversible mechanism, respectively. MST in transparent conducting oxide (TCO) is possibly associated with the undoped structure of metal oxide, which has some disorder of oxygen vacancies. It was suggested that reversible UV induced metal-semiconductor transition would occur in other TCOs.

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Держатели документа:
Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
Reshetnev Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia
Russian Acad Sci, Siberian Branch, Krasnoyarsk Sci Ctr, Krasnoyarsk 660036, Russia

Доп.точки доступа:
Tambasov, I. A.; Тамбасов, Игорь Анатольевич; Myagkov, V. G.; Мягков, Виктор Григорьевич; Tarasov, A. S.; Тарасов, Антон Сергеевич; Ivanenko, A. A.; Иваненко, Александр Анатольевич; Bykova, L. E.; Быкова, Людмила Евгеньевна; Nemtsev, I. V.; Немцев, Иван Васильевич; Eremin, E. V.; Еремин, Евгений Владимирович; Yozhikova, E. V.; Federal Target Program [14.513.11.0023]; Russian Foundation for Basic Research [14-02-31156]
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