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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Kuzubov A. A., Eliseeva N. S., Krasnov P. O., Tomilin F. N., Fedorov A. S., Tolstaya A. V.
Заглавие : Possibility of a 2D SiC monolayer formation on Mg(0001) and MgO(111) substrates
Место публикации : Russ. J. Phys. Chem. A: MAIK Nauka-Interperiodica / Springer, 2013. - Vol. 87, Is. 8. - P.1332-1335. - ISSN 0036-0244, DOI 10.1134/S0036024413080141
Примечания : Cited References: 25
Предметные рубрики: AB-INITIO
THIN-FILMS
NANOTUBES
ENERGY
Ключевые слова (''Своб.индексиров.''): silicon carbide monolayer--density functional theory
Аннотация: The geometrical characteristics of a 2D SiC monolayer on Mg(0001) and MgO(111) plates regarded as potential materials for growing two-dimensional silicon carbide were studied. The most favorable positions of the atoms of 2D SiC on the substrates were determined. In the 2D SiC/Mg(0001) system, unlike in 2D SiC/MgO(111), the deviation of the carbon atom from the silicon carbide monolayer was insignificant (0.08 ). Consequently, magnesium can be used as a substrate for growing two-dimensional silicon carbide. The use of MgO(111) is not recommended because of a significant distortion of the 2D SiC surface.
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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Kuzubov A. A., Eliseeva N. S., Popov Z. I., Fedorov A. S., Serzhantova M. V., Denisov V. M., Tomilin F. N.
Заглавие : Theoretical study of sorption and diffusion of lithium atoms on the surface of crystalline silicon and inside it
Место публикации : JETP Letters. - 2013. - Vol. 97, Is. 11. - P.634-638. - ISSN 0021-3640, DOI 10.1134/S0021364013110088
Аннотация: The energy of the sorption and diffusion of lithium atoms on the reconstructed (4 ? 2) (100) silicon surface in the process of their transport into near-surface layers, as well as inside crystalline silicon, at various lithium concentrations have been investigated within the density functional theory. It has been shown that single lithium atoms easily migrate on the (100) surface and gradually fill the surface states (T3 and L) located in channels between silicon dimers. The diffusion of lithium into near-surface silicon layers is hampered because of high potential barriers of the transition (1.22 eV). The dependences of the binding energy, potential barriers, and diffusion coefficient inside silicon on distances to the nearest lithium atoms have also been examined. It has been shown that an increase in the concentration of lithium to the Li0.5Si composition significantly reduces the transition energy (from 0.90 to 0.36 eV) and strongly increases (by one to three orders of magnitude) the lithium diffusion rate. В© 2013 Pleiades Publishing, Ltd.
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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Кузубов, Александр Александрович, Елисеева, Наталья Сергеевна, Попов, Захар Иванович, Федоров, Александр Семенович, Сержантова, Мария Викторовна, Денисов, Виктор Михайлович, Томилин, Феликс Николаевич
Заглавие : Теоретическое исследование сорбции и диффузии атомов лития на поверхности и внутри кристаллического кремния
Место публикации : Письма в Журн. эксперим. и теор. физ. - 2013. - Т. 97, Вып. 11. - С. 732-736. - DOI 10.7868/S0370274X13110064
Аннотация: В рамках теории функционала плотности изучены энергия сорбции и диффузия атомов лития по реконструированной (4× 2) поверхности (100) кремния при их переходе в подповерхностные слои, а также внутри кристаллического кремния при различной концентрации лития. Показано, что одиночные атомы лития легко мигрируют по поверхности (100), постепенно заполняя поверхностные состояния (Т3 и L), расположенные в каналах между димерами кремния. Диффузия лития в подповерхностные слои кремния затруднена в связи с высокими потенциальными барьерами перехода (1.22 эВ). Также исследованы зависимости энергии связи, потенциальных барьеров и коэффициента диффузии атомов лития внутри кремния от расстояний до ближайших атомов лития. Показано, что увеличение его концентрации до состава Li0.5Si существенно снижает энергию перехода (с 0.90 до 0.36 эВ) и вызывает значительное (на 1-3 порядка) увеличение скорости диффузии лития.
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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Volkov N. V., Tarasov A. S., Eremin E. V., Baron F. A., Varnakov S. N., Ovchinnikov S. G.
Заглавие : Extremely large magnetoresistance induced by optical irradiation in the Fe/SiO2/p-Si hybrid structure with Schottky barrier
Коллективы : Russian Foundation for Basic Research [11-02-00367-a]; Presidium of the Russian Academy of Sciences, program Quantum Mesoscopic and Disordered Structures [20.8]; Division of Physical Sciences of the Russian Academy of Sciences, program Spin Phenomena in Solids Nanostructures and Spintronics [II.4.3]; Siberian Branch of the Russian Academy of Sciences [43, 85, 102]; Russian Ministry of Education and Science [N 02.G25.31.0043]
Место публикации : J. Appl. Phys.: American Institute of Physics, 2013. - Vol. 114, Is. 9. - Ст.093903. - P. - ISSN 0021-8979, DOI 10.1063/1.4819975
Примечания : Cited References: 31. - This study was supported by the Russian Foundation for Basic Research, Project No. 11-02-00367-a; Presidium of the Russian Academy of Sciences, program Quantum Mesoscopic and Disordered Structures, Project No. 20.8; the Division of Physical Sciences of the Russian Academy of Sciences, program Spin Phenomena in Solids Nanostructures and Spintronics, Project No. II.4.3; the Siberian Branch of the Russian Academy of Sciences, integration projects nos. 43, 85 and 102; Project of the Russian Ministry of Education and Science N 02.G25.31.0043.
Предметные рубрики: SPIN POLARIZATION
SPINTRONICS
SILICON
Аннотация: We report giant magnetoresistance (MR) effect that appears under the influence of optical radiation in common planar device built on Fe/SiO2/p-Si hybrid structure. Our device is made of two Schottky diodes connected to each other by the silicon substrate. Photo-induced MR is positive and the MR ratio reaches the values in excess of 10(4)%. The main peculiarity of the MR behavior is its strong dependence on the magnitude and the sign of the bias current across the device and, most surprisingly, upon polarity of the magnetic field. To explain such unexpected behavior of the MR, one needs to take into account contribution of several physical mechanisms. The main contribution comes from the existence of localized interface states at the SiO2/p-Si interface, which provide the spots for the photo-current conduction by virtue of the sequential tunneling through them or thermal generation and optical excitation of mobile charges. External magnetic field changes the probability of these processes due to its effect on the energy states of the conduction centers. Two possible mechanisms that may be responsible for the observed dependence of magneto-resistance on the field polarity are discussed: the effect of the Lorentz force on moving carriers and spin splitting of electrons moving in the electrostatic potential gradient (Rashba effect). The most significant observation, in our opinion, is that the observed MR effect is seen exclusively in the subsystem of minority carriers transferred into non-equilibrium state by optical excitation. We suggest that building such magneto-sensitive devices based on this mechanism may set a stage for new types of spintronic devices to emerge. (C) 2013 AIP Publishing LLC.
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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Komogortsev S. V., Varnakov S. N., Satsuk S. A., Yakovlev I. A., Ovchinnikov S. G.
Заглавие : Magnetic anisotropy in Fe films deposited on SiO2/Si(001) and Si(001) substrates
Место публикации : J. Magn. Magn. Mater.: Elsevier Science, 2014. - Vol. 351. - P.104-108. - ISSN 0304-8853, DOI 10.1016/j.jmmm.2013.09.058. - ISSN 873-4766
Примечания : Cited References: 40. - The work has been supported by RFBR Grant 11-03-00168-a, 12-02-00943-a, 13-02-01265-a, Interdisciplinary integration of fundamental research of SB RAS (2012-2014) project No. 64. Also the study was supported by The Ministry of Education and Science of Russian Federation, project 14.513.11.0016.
Предметные рубрики: UNIAXIAL ANISOTROPY
SURFACE
SILICON
ROUGHNESS
Ключевые слова (''Своб.индексиров.''): epitaxial growth--iron--magnetic anisotropy--thin film
Аннотация: The magnetic anisotropy of 10 nm iron films deposited in an ultra high vacuum on the Si(001) surface and on the Si(001) over caped by 1.5 nm layer of SiO2 was investigated. There is in-plane uniaxial magnetic anisotropy caused by oblique sputtering in the Fe films on a SiO2 buffer layer. The easy magnetization axis is always normal to the atomic flux direction but the value of the anisotropy field is different depending on the axial angle among sputtering direction and the substrate crystallographic axes. It is argued that the uniaxial magnetic anisotropy results from elongated surface roughness formation during film deposition. Several easy magnetization axes are found in Fe/Si(001) film without the SiO2 buffer layer. The mutual orientation of the main easy axes and Si crystallographic axes indicates that there is epitaxial growth of Fe/Si(001) film with the following orientation relative to the substrate: Fe[100] ?Si[110]. The anisotropy energy of Fe/Si(001) film is estimated by simulation of angle dependence of remnant magnetization m r as the sum of the mr angle plot from uniaxial anisotropy (induced by oblique deposition) and the polar plot from biaxial magnetocrystalline anisotropy. В© 2013 Elsevier B.V.
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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Fedorov A. S., Popov Z. I., Kuzubov A. A., Ovchinnikov S. G.
Заглавие : Theoretical study of the diffusion of lithium in crystalline and amorphous silicon
Место публикации : JETP Letters. - 2012. - Vol. 95, Is. 3. - P.143-147. - ISSN 0021-3640, DOI 10.1134/S0021364012030058
Примечания : Cited References: 28. - We are grateful to the Institute of Computational Modeling, Siberian Branch, Russian Academy of Sciences; the Interdepartmental Supercomputer Center, Russian Academy of Sciences; and the Computer Center, Siberian Federal University, for the use of their computer clusters for performing all calculations. This work was supported by the Ministry of Education and Science of the Russian Federation (federal program "Human Capital for Science and Education in Innovative Russia" for 2009-2013).
Предметные рубрики: ACCELERATED MOLECULAR-DYNAMICS
AB-INITIO
INFREQUENT EVENTS
SIMULATION
RELAXATION
HYDROGEN
POINTS
SI
Аннотация: The effect of the lattice deformation on potential barriers for the motion of a lithium atom in crystalline silicon has been studied through ab initio density functional calculations. A new universal method of calculating the diffusion coefficient of an admixture in amorphous solid media through the activation mechanism has been proposed on the basis of these data. The method is based on the calculation of the statistical distribution of potential barriers for the motion of an admixture atom between minima depending on the position of neighboring atoms. First, the amorphous structure, which is generated by annealing from the crystalline structure with vacancies, has been simulated. Then, the statistical distribution of the potential barriers in the amorphous structure for various local environments of the admixture atoms has been calculated by means of linear regression with the parameters determined for barriers in crystalline silicon subjected to different deformations. The diffusion coefficient of the admixture has been calculated from this distribution by using the Arrhenius formula. This method has been tested by the example of crystalline and amorphous silicon with admixture of lithium atoms. The method demonstrates that the diffusion of lithium in amorphous silicon is much faster than that in crystalline silicon; this relation is confirmed experimentally.
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Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Федоров, Александр Семенович, Попов, Захар Иванович, Кузубов, Александр Александрович, Овчинников, Сергей Геннадьевич
Заглавие : Теоретическое исследование диффузии лития в кристаллическом и аморфном кремнии
Место публикации : Письма в Журн. эксперим. и теор. физ.: Санкт-Петербургская издательская фирма "Наука" РАН, 2012. - Т. 95, Вып. 3. - С. 159-163. - ISSN 0370-274X
Аннотация: Методом ab initio DFT-расчетов проведено исследование влияния деформации решетки на величины потенциальных барьеров для движения атома лития в кристаллическом кремнии. C использованием этих данных предложен новый универсальный метод расчета коэффициента диффузии примеси в аморфных твердых средах, происходящей по активационному механизму. Метод основан на вычислении статистического распределения величин потенциальных барьеров для движения атома примеси между минимумами в зависимости от положения соседних атомов. При этом вначале проводится моделирование аморфной структуры, генерируемой методом отжига из кристаллической структуры с вакансиями. Далее с помощью линейной регрессии с параметрами, определяемыми для барьеров в кристаллическом кремнии, подвергаемом различной деформации, вычисляется статистическое распределение потенциальных барьеров в аморфной структуре для различных локальных окружений атома примеси. Из полученного распределения с применением формулы Аррениуса вычисляется коэффициент диффузии примеси. Представленный метод протестирован на примере кристаллического и аморфного кремния с примесью атомов лития. Метод показал существенное ускорение диффузии лития в аморфном кремнии по сравнению с кристаллическим, что подтверждается экспериментами.
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Вид документа : Статья из сборника (однотомник)
Шифр издания :
Автор(ы) : Volkov N. V., Eremin E. V., Tarasov A. S., Varnakov S. N., Ovchinnikov S. G.
Заглавие : Bias-current and optically driven transport properties of the hybrid Fe/SiO 2/p-Si structures
Коллективы : Moscow International Symposium on Magnetism
Место публикации : Diffusion and Defect Data Pt.B: Solid State Phenomena. - 2012. - Vol. 190. - P.526-529. - ISBN 1012-0394, DOI 10.4028/www.scientific.net/SSP.190.526. - ISBN 9783037854365
Ключевые слова (''Своб.индексиров.''): hybrid structure--mis transition--photoelectric effect--schottky barrier--channel switching--comparative analysis--electron hole pairs--fe films--fe layer--ferromagnetic films--hybrid structure--optical effects--optical radiations--photogeneration--planar geometries--schottky barriers--semiconductor substrate--temperature variation--critical currents--interfaces (materials)--magnetic materials--photoelectricity--schottky barrier diodes--silicon--switching circuits--transport properties
Аннотация: Pronounced optical- and bias-current-sensitive features of the transport properties of a Fe/SiO 2/p-Si hybrid structure in planar geometry at temperature variation are investigated. Comparative analysis of two Fe/SiO 2/p-Si samples, one with a continuous Fe film and the other with two electrodes formed from a Fe layer and separated by a micron gap, shows that these features are due to the MIS transition with a Schottky barrier near the interface between SiO 2 and p- Si. Resistance of such a MIS transition depends exponentially on temperature and bias. In the structure with a continuous ferromagnetic film, the competition between conductivities of the MIS transition and the Fe layer results in the effect of current channel switching between the Fe layer and a semiconductor substrate. Within certain limits, this process can be controlled by a bias current and optical radiation. The mechanism of the optical effect is photogeneration of electron-hole pairs in the semiconductor substrate near its boundary with SiO 2 layer. В© (2012) Trans Tech Publications.
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Вид документа : Статья из сборника (однотомник)
Шифр издания :
Автор(ы) : Fedorov A. S., Vysotin M. A.
Заглавие : Development of the new empirical potential based on first-principles calculations of silicon nanostructures and its application to modeling of the amorphous silicon
Коллективы : Asian School-Conference on Physics and Technology of Nanostructured Materials, Азиатская школа-конференция по физике и технологии наноструктурированных материалов
Место публикации : Asian School-Conference on Physics and Technology of Nanostructured Materials. - 2013. - P.145-146
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10.

Вид документа : Статья из сборника (однотомник)
Шифр издания :
Автор(ы) : Fedorov A. S., Kuzubov A. A., Eliseeva N. S., Popov Z. I.
Заглавие : Theoretical study of the lithium diffusion in the crystalline and amorphous silicon, as well as on its surface at different lithium concentrations
Коллективы : Asian School-Conference on Physics and Technology of Nanostructured Materials, Азиатская школа-конференция по физике и технологии наноструктурированных материалов
Место публикации : Asian School-Conference on Physics and Technology of Nanostructured Materials. - 2013. - P.133-134
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11.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Volkov N. V., Tarasov A. S., Eremin E. V., Varnakov S. N., Ovchinnikov S. G., Zharkov S. M.
Заглавие : Magnetic-field- and bias-sensitive conductivity of a hybrid Fe/SiO 2/p-Si structure in planar geometry
Место публикации : J. Appl. Phys. - 2011. - Vol. 109, Is. 12. - Ст.123924. - P. - ISSN 0021-8979, DOI 10.1063/1.3600056
Ключевые слова (''Своб.индексиров.''): channel switching--comparative analysis--fe films--fe layer--ferromagnetic films--high temperature--hybrid structure--inversion layer--metal-insulator-semiconductors--negative magneto-resistance--planar geometries--positive magnetoresistance--schottky barriers--semiconductor substrate--temperature variation--weak localization--critical currents--electric resistance--ferromagnetic materials--geometry--magnetic fields--magnetoelectronics--magnetoresistance--metal insulator boundaries--metal insulator transition--mis devices--schottky barrier diodes--silicon--silicon compounds--switching circuits--transport properties--semiconducting silicon
Аннотация: Pronounced magnetic-field- and bias-sensitive features of the transport properties of a Fe/SiO2/p-Si hybrid structure in planar geometry at temperature variation are investigated. Comparative analysis of two Fe/SiO 2/p-Si samples, one with a continuous Fe film and the other with two electrodes formed from a Fe layer and separated by a micron gap, shows that these features are due to the metal-insulator-semiconductor (MIS) transition with a Schottky barrier near the interface between SiO2 and p-Si. Resistance of such a MIS transition depends exponentially on temperature and bias. In the structure with a continuous ferromagnetic film, the competition between conductivities of the MIS transition and the Fe layer results in the effect of current channel switching between the Fe layer and a semiconductor substrate. Within certain limits, this process can be controlled by a bias current and a magnetic field. Positive magnetoresistance of the structures at high temperatures is determined, most likely, by disorder-induced weak localization. In the structure with the gap, negative magnetoresistance is observed at certain temperature and bias. Its occurrence should be attributed to an inversion layer formed in the semiconductor near the SiO2/p-Si interface when MIS transition is in the inversion regime. В© 2011 American Institute of Physics.
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12.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Volkov N. V., Tarasov A. S., Eremin E. V., Eremin A. V., Varnakov S. N., Ovchinnikov S. G.
Заглавие : Frequency-dependent magnetotransport phenomena in a hybrid Fe/SiO2/p-Si structure
Место публикации : J. Appl. Phys.: American Institute of Physics, 2012. - Vol. 112, Is. 12. - Ст.123906. - ISSN 0021-8979, DOI 10.1063/1.4769788
Примечания : Cited References: 31. - This study was supported by the Russian Foundation for Basic Research, Project No. 11-02-00367-a; the Presidium of the Russian Academy of Sciences, program Quantum Mesoscopic and Disordered Structures, Project No. 20.8; the Division of Physical Sciences of the Russian Academy of Sciences, program Spin Phenomena in Solids Nanostructures and Spintronics, Project No. II.4.3; the Siberian Branch of the Russian Academy of Sciences, Integration Projects Nos. 85 and 102, and the Federal target program Scientific and Pedagogical Personnel of Innovative Russia (State Contract No. NK-556P_15).
Предметные рубрики: SILICON
IRON
SPINTRONICS
PAIRS
Аннотация: We report the large magnetoimpedance effect in a hybrid Fe/SiO2/p-Si structure with the Schottky barrier. The pronounced effect of magnetic field on the real and imaginary parts of the impedance has been found at temperatures 25-100K in two relatively narrow frequency ranges around 1 kHz and 100MHz. The observed frequency-dependent magnetotransport effect is related to the presence of localized "magnetic" states near the SiO2/p-Si interface. In these states, two different recharging processes with different relaxation times are implemented. One process is capture-emission of carriers that involves the interface levels and the valence band; the other is the electron tunneling between the ferromagnetic electrode and the interface states through SiO2 potential barrier. In the first case, the applied magnetic field shifts energy levels of the surface states relative to the valence band, which changes recharging characteristic times. In the second case, the magnetic field governs the spin-dependent tunneling of carriers through the potential barrier. The "magnetic" interface states originate, most likely, from the formation of the centers that contain Fe ions, which can easily diffuse through the SiO2 layer. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4769788]
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13.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Goryainov S. V., Krylov A. S., Likhacheva A.Yu., Vtyurin A. N.
Заглавие : Raman investigation of fibrous zeolites of the natrolite group at high pressures of an aqueous medium
Место публикации : Bull. Russ. Acad. Sci.: Phys. - 2012. - Vol. 76, Is. 7. - P.804-807. - ISSN 1062-8738, DOI 10.3103/S1062873812070143
Примечания : Cited References: 7
Ключевые слова (''Своб.индексиров.''): aqueous medium--high pressure--intermediate phase--intermediate phasis--raman bands--raman investigations--water molecule--xrd--raman spectroscopy--silicon--zeolites
Аннотация: The intermediate phases preceding overhydration are observed by Raman spectroscopy both in scolecite Ca[Al2Si3O10] вЂў 3H2O and in thomsonite NaCa2[Al5Si 5O20] вЂў 6H2O upon compression in an aque-ous medium. The first intermediate phase of scolecite is attributed to a phase precursor revealed earlier using XRD at pressure of ~1 GPa. The widening of the Raman bands of O-H vibrations caused by the disordering of H 2O, which appears after additional water molecules are embedded in the zeolite channels, is typical of this intermediate phase. It is assumed on the basis of the Raman spectroscopy data that scolecite contains sec-ond overhydrated and second intermediate phases. В© 2012 Allerton Press, Inc.
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14.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Kuzubov A. A., Eliseeva N. S., Krasnov P. O., Tomilin F. N., Fedorov A. S., Tolstaya A. V.
Заглавие : Calculating the energy of vacancies and adatoms in a hexagonal SiC monolayer
Место публикации : Russ. J. Phys. Chem. A: MAIK Nauka-Interperiodica / Springer, 2012. - Vol. 86, Is. 7. - P.1091-1095. - ISSN 0036-0244, DOI 10.1134/S0036024412070138
Примечания : Cited References: 21
Предметные рубрики: INITIO MOLECULAR-DYNAMICS
ELECTRONIC-PROPERTIES
ABSORPTION-SPECTRA
Ключевые слова (''Своб.индексиров.''): silicon carbide--defects--adatoms--density functional method
Аннотация: It is noted that the development of semiconductor SiC-electronics is prevented by a low quality of grown silicon carbide single crystals. It is found that structural defects of a substrate penetrating into an epitaxial layer upon subsequent homoepitaxial growth can considerably degrade a device's characteristics. We investigate the effect of the deformation of a hexagonal SiC monolayer on vacancy stability and material properties, and study the processes of silicon and carbon adatom migration over a surface of SiC.
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15.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Varnakov S. N., Gomoyunova M. V., Grebenyuk G. S., Zabluda V. N., Ovchinnikov S. G., Pronin I. I.
Заглавие : Initial growth stages of manganese films on the Si(100)2 x 1 surface
Коллективы : Russian-German Laboratory at HZB BESSY; Ministry of Education and Science of the Russian Federation [14V37.21.1276]; Russian Foundation for Basic Research [13-02-00398, 13-02-01265]
Место публикации : Phys. Solid State: MAIK Nauka-Interperiodica / Springer, 2014. - Vol. 56, Is. 2. - P.380-384. - ISSN 1063-7834, DOI 10.1134/S1063783414020310. - ISSN 1090-6460
Примечания : Cited References: 20. - This study was supported by the Russian-German Laboratory at HZB BESSY, the Ministry of Education and Science of the Russian Federation (agreement 14V37.21.1276), and the Russian Foundation for Basic Research (project nos. 13-02-00398 and 13-02-01265).
Предметные рубрики: PHOTOELECTRON-SPECTROSCOPY
ROOM-TEMPERATURE
SILICIDES
SILICON
Аннотация: Initial growth stages of manganese films on the Si(100)2 × 1 surface at room temperature have been investigated using high-energy-resolution photoelectron spectroscopy, and the dynamics of the variation in their phase composition and electronic structure with the coverage growth has been revealed. It has been shown that the interfacial manganese silicide and the film of the solid solution of silicon in manganese are sequentially formed under these conditions on the silicon surface. The growth of the metal manganese film starts after the deposition of ~0.9 nm Mn. Segregation of silicon on the film surface is observed in the range of coverages up to 1.6 nm Mn.
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16.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Yakovlev I. A., Varnakov S. N., Belyaev B. A., Zharkov S. M., Molokeev M. S., Tarasov I. A., Ovchinnikov S. G.
Заглавие : Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films
Коллективы : Russian Foundation for Basic Research [13-02-01265]; Council of the President of the Russian Federation for Support of Young Scientists and Leading Scientific Schools [NSh-2886.2014.2]; Ministry of Education and Science of the Russian Federation [02G25.31.0043]
Место публикации : JETP Letters. - 2014. - Vol. 99, Is. 9. - P.527-530. - ISSN 0021-3640, DOI 10.1134/S0021364014090124. - ISSN 1090-6487
Примечания : Cited References: 19. - This work was supported by the Russian Foundation for Basic Research (project no. 13-02-01265), the Council of the President of the Russian Federation for Support of Young Scientists and Leading Scientific Schools (project no. NSh-2886.2014.2), and the Ministry of Education and Science of the Russian Federation (state contract no. 02G25.31.0043; state task of the Siberian Federal University for research in 2014).
Предметные рубрики: ULTRAHIGH-VACUUM
SILICON
Аннотация: The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe3Si silicide film with the orientation Si[111]‖Fe3Si[111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe3Si film at room temperature has magnetic uniaxial anisotropy (H a = 26 Oe) and a relatively narrow uniform ferromagnetic resonance line (ΔH = 11.57 Oe) measured at a pump frequency of 2.274 GHz.
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17.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Fedorov A. S., Kuzubov A. A., Eliseeva N. S., Popov Z. I., Visotin M. A., Galkin N. G.
Заглавие : Theoretical study of the lithium diffusion in the crystalline and amorphous silicon as well as on its surface
Коллективы : Asian School-Conference on Physics and Technology of Nanostructured Materials, Азиатская школа-конференция по физике и технологии наноструктурированных материалов
Место публикации : Solid State Phenom.: Selected, peer reviewed papers/ ed. N. Galkin: Trans Tech Publications, 2014. - Vol. 213: Physics and Technology of Nanostructured Materials II. - P.29-34. - ISSN 1662-9779, DOI 10.4028/www.scientific.net/SSP.213.29. - ISSN 978-3-03785-970-4
Примечания : Cited References: 21
Ключевые слова (''Своб.индексиров.''): ab initio calculations--diffusion--lithium-ion accumulators--silicon
Аннотация: Using the PAW DFT-GGA method and numerical solving of master equation the diffusion rates of lithium atoms inside both crystal and amorphous silicon of LixSi (x= 0.0.5) composition have been calculated for different temperatures. It is shown the diffusion rate for amorphous silicon is ~10 times greater than that for the crystal silicon. For both structures the rate is increased by 1.5-2 orders of magnitude while the lithium concentration is increased up to 0.5 value. This should result in that the LixSi/Si interface will be sharp. This fact has been further confirmed using molecular dynamic calculations based on Angular Dependent Potential (ADP) model. Also binding energies of Li atoms lying on different sites of Si (001) surface as well as the potential barriers for the atom jumps both along the surface and in the subsurface layers have been calculated. The data show the Li atoms move along the surface very easily but their jumps into subsurface layers are very difficult due to the high potential barrier values. В© (2014) Trans Tech Publications, Switzerland.
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18.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Voronkov M. G., Grebneva E. A., Albanov A. I., Zel'bst E. A., Trofimova O. M., Vasil'ev A. D., Chernov N. F., Timofeeva E. N.
Заглавие : Neutral pentacoordinate silicon complexes with SiO2FC skeleton:. Synthesis, structural characterization and stereodynamical behavior
Коллективы : Found of President of Russian Federation [3649.2014.3]; Russian Foundation for Basic Research [14-03-31381 \14]
Место публикации : J. Organomet. Chem.: Elsevier Science, 2014. - Vol. 768. - P.10-14. - ISSN 0022-328X, DOI 10.1016/j.jorganchem.2014.05.025. - ISSN 1872-8561
Примечания : Cited References: 31. - We thank the Found of President of Russian Federation (Science Schools' Grant - 3649.2014.3) and Russian Foundation for Basic Research (No. 14-03-31381 \14) for financial support. We thank Prof. Bagrat Shainyan (Irkutsk Institute of Chemistry) for calculation SUP19/SUPF NMR spectra and helpful discussion and Dr. Svetlana Kirpichenko (Irkutsk Institute of Chemistry) for all the help rendered.
Предметные рубрики: 1,3-DIOXA-6-AZA-2-SILACYCLOOCTANES
DIETHANOLAMINES
DERIVATIVES
SILATRANES
REACTIVITY
NITROGEN
ELEMENTS
Ключевые слова (''Своб.индексиров.''): pentacoordinate silicon--1-fluoro-1-aryl-5-methylquasisilatranes--synthesis--x-ray diffraction
Аннотация: A series of new pentacoordinate intramolecular organosilicon complexes F(Ar)Si(OCH2CH2)2NMe (Ar = 4-MeC6H4 (1), 4-MeOC6H4 (2), 4-ClC6H4 (3), 2-BrC6H4 (4), 3-NO2C6H4 (5)) has been synthesized by transsilylation of aryltrifluorosilanes ArSiF3 by N-methyl-bis(2-trimethylsiloxyethyl)amine. Compounds 1–5 have been fully characterized by 1H, 13C, 19F, 29Si NMR spectroscopy and X-ray diffraction analysis (for compound 3). Variable-temperature 19F NMR studies of 5 indicate stereodynamic process of the ligand exchange with activation barrier Δ G c ≠ of 13.1 kcal mol−1.
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19.

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Киренский, Леонид Васильевич, Патюкова З. М.
Заглавие : Исследование упругого гистерезиса, термоупругого эффекта в никеле и никель-кремнистых сплавах
Коллективы : Симпозиум по вопросам ферро- и антиферромагнетизма (1962 ; 25 июня - 7 июля; Красноярск)
Место публикации : Изв. АН СССР, Сер. физич./ предс. орг. ком. С. В. Вонсовский. - 1964. - Т. 28, № 1. - С. 198-201
Примечания : Библиогр.: 8 назв. - Phys. Abstr. - 1966. - Vol. 69, 5593
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20.

Вид документа : Статья из сборника (однотомник)
Шифр издания :
Автор(ы) : Sorokin B. P., Marushyak A. N., Aleksandrov K. S.
Заглавие : Influence of heterogeneous external fields on propagation of bulk acoustic waves in crystals
Коллективы : IEEE International ultrasonics symposium
Место публикации : Proceedings - IEEE Ultrasonics Symposium. - 2008. - Ст.4803313. - P.1472-1475. - ISBN 1051-0117, DOI 10.1109/ULTSYM.2008.0358
Ключевые слова (''Своб.индексиров.''): bulk elastic wave--non-homogeneous mechanical loading--phase velocity--wave surface--bulk acoustic waves--bulk elastic wave--bulk waves--external fields--non-homogeneous--non-homogeneous mechanical loading--numerical calculation--small amplitude--wave surface--acoustic fields--crystals--elastic waves--elasticity--phase velocity--silicon compounds--soil structure interactions--waves--velocity
Аннотация: Formulas describing the influence of nonhomogeneous pressure on propagation of bulk waves in crystals have derived. Phase velocity for small amplitude waves in Bi12SiO20 crystal the action of non-homogeneous pressure has been . Under those conditions the behavior of the wave has researched. Numerical calculation of phase velocity of and their directions propagation changing have obtained. В©2008 IEEE.
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