Библиотека института физики им. Л.В. Киренского СО РАН

Главная

Базы данных

Труды сотрудников ИФ СО РАН - результаты поиска

Вид поиска

Каталог книг и брошюр библиотеки ИФ СО РАН

Каталог журналов библиотеки ИФ СО РАН

Труды сотрудников ИФ СО РАН

Область поиска

Формат представления найденных документов:
полный	информационный	краткий

Отсортировать найденные документы по:
автору	заглавию	году издания	типу документа

Поисковый запрос: (<.>S=ULTRAHIGH-VACUUM<.>)

Общее количество найденных документов : 4
Показаны документы с 1 по 4

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Yakovlev I. A., Varnakov S. N., Belyaev B. A., Zharkov S. M., Molokeev M. S., Tarasov I. A., Ovchinnikov S. G.
Заглавие : Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films
Коллективы : Russian Foundation for Basic Research [13-02-01265]; Council of the President of the Russian Federation for Support of Young Scientists and Leading Scientific Schools [NSh-2886.2014.2]; Ministry of Education and Science of the Russian Federation [02G25.31.0043]
Место публикации : JETP Letters. - 2014. - Vol. 99, Is. 9. - P.527-530. - ISSN 0021-3640, DOI 10.1134/S0021364014090124. - ISSN 1090-6487
Примечания : Cited References: 19. - This work was supported by the Russian Foundation for Basic Research (project no. 13-02-01265), the Council of the President of the Russian Federation for Support of Young Scientists and Leading Scientific Schools (project no. NSh-2886.2014.2), and the Ministry of Education and Science of the Russian Federation (state contract no. 02G25.31.0043; state task of the Siberian Federal University for research in 2014).
Предметные рубрики: ULTRAHIGH-VACUUM
SILICON
Аннотация: The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe3Si silicide film with the orientation Si[111]‖Fe3Si[111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe3Si film at room temperature has magnetic uniaxial anisotropy (H a = 26 Oe) and a relatively narrow uniform ferromagnetic resonance line (ΔH = 11.57 Oe) measured at a pump frequency of 2.274 GHz.
Смотреть статью,
Scopus,
WOS,
Читать в сети ИФ
Найти похожие

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Bartolome J., Badía-Romano L., Rubin J., Bartolome F., Varnakov S. N., Ovchinnikov S. G., Burgler D.E.
Заглавие : Magnetic properties, morphology and interfaces of (Fe/Si)n nanostructures
Коллективы : International Conference on Magnetism
Место публикации : J. Magn. Magn. Mater.: Elsevier, 2016. - Vol. 400. - P.271-275. - ISSN 03048853 (ISSN), DOI 10.1016/j.jmmm.2015.07.046
Примечания : Cited References: 43. - The financial support of the Spanish MINECOMAT2011-23791 and MAT2015-53921-R, Aragonese DGA-IMANAE34 (cofounded by Fondo Social Europeo) and European FEDER funds is acknowledged. Program of the President of the Russian Federation for the support of leading scientific schools (Scientific School 2886.2014.2), RFBR (Grant no. 13-02-01265), the Ministry of Education and Science of the Russian Federation (State contract no. 02.G25.31.0043 and State task no. 16.663.2014К)
Предметные рубрики: INTERLAYER EXCHANGE
Fe/Si(100) INTERFACE
SILICIDE FORMATION
ULTRAHIGH-VACUUM
FILMS
IRON
MAGNETORESISTANCE
SUPERLATTICES
SPECTROSCOPY
DEPOSITION
Аннотация: A systematic study of the iron–silicon interfaces formed upon preparation of (Fe/Si) multilayers has been performed by the combination of modern and powerful techniques. Samples were prepared by molecular beam epitaxy under ultrahigh vacuum onto Si wafers or single crystalline Ag(100) buffer layers grown on GaAs(100). The morphology of these films and their interfaces was studied by a combination of scanning transmission electron microscopy, X-ray reflectivity, angle resolved X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The Si-on-Fe interface thickness and roughness were determined to be 1.4(1) nm and 0.6(1) nm, respectively. Moreover, determination of the stable phases formed at both Fe-on-Si and Si-on-Fe interfaces was performed using conversion electron Mössbauer spectroscopy on multilayers with well separated Si-on-Fe and Fe-on-Si interfaces. It is shown that while a fraction of Fe remains as α-Fe, the rest has reacted with Si, forming the paramagnetic FeSi phase and a ferromagnetic Fe rich silicide. We conclude that there is an identical paramagnetic c-Fe1−xSi silicide sublayer in both Si-on-Fe and Fe-on-Si interfaces, whereas an asymmetry is revealed in the composition of the ferromagnetic silicide sublayer.
Смотреть статью,
Scopus,
WOS,
Читать в сети ИФ
Найти похожие

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Varnakov S. N., Komogortsev S. V., Ovchinnikov S. G., Bartolome J., Sese J.
Заглавие : Magnetic properties and nonmagnetic phases formation in (Fe/Si)(n) films
Коллективы :
Разночтения заглавия :авие SCOPUS: Magnetic properties and nonmagnetic phases formation in (Fe/Si) n films
Место публикации : J. Appl. Phys.: AMER INST PHYSICS, 2008. - Vol. 104, Is. 9. - Ст.94703. - ISSN 0021-8979, DOI 10.1063/1.3005973
Примечания : Cited References: 23. - This work was supported by the Russian Academy of Science program "Spintronics," the complex integration project of the Siberian Branch of the Russian Academy of Science. 3.5, the Russian Foundation for Basic Research (Grant No. 07-03-00320), the "Ramon y Cajal" program, and Project No. MAT 2005/01272 of the Spanish Ministry of Education and Science.
Предметные рубрики: FE/SI/FE TRILAYER FILMS
GIANT MAGNETORESISTANCE
ULTRAHIGH-VACUUM
SUPERLATTICES
MULTILAYERS
EXCHANGE
Ключевые слова (''Своб.индексиров.''): activation energy--integral equations--magnetic properties--magnetization--magnets--multilayers--rate constants--silicon--thermal evaporation--vacuum--vacuum evaporation--fe layers--high temperatures--interface layers--irreversible behaviors--kinetic equations--n films--nonmagnetic--nonmagnetic phases--prefactor--quantitative analysis--rate equations--synthetic procedures--temperature dependences--ultrahigh-vacuum systems--phase interfaces
Аннотация: The magnetization of Fe/Si multilayers, grown by thermal evaporation in an ultrahigh vacuum system, was investigated at high temperatures. Magnetization and its temperature dependence up to a high temperature of 800 K depend on individual Fe layer thickness d(Fe). This dependence is the result of the formation of an Fe-Si interface layer (nonmagnetic phase) during the synthetic procedure. The fraction of this Fe-Si nonmagnetic phase is estimated versus dFe. At temperatures higher than 400 K an irreversible decrease in the magnetization occurs. A quantitative analysis of this irreversible behavior is proposed in terms of an exponential diffusion-like kinetic equation for the reaction that produces the Fe-Si nonmagnetic phase. The coefficients of the rate equation are the activation energy E(a) and the prefactor D(0), which have been determined for different d(Fe). (C) 2008 American Institute of Physics. [DOI: 10.1063/1.3005973]
WOS,
Scopus,
Читать в сети ИФ
Найти похожие

Вид документа : Статья из журнала
Шифр издания :
Автор(ы) : Varnakov S. N., Bartolome J., Sese J., Ovchinnikov S. G., Komogortsev S. V., Parshin A. S., Bondarenko G. V.
Заглавие : Size effects and magnetization of (Fe/Si)(n) multilayer film nanostructures
Разночтения заглавия :авие SCOPUS: Size effects and magnetization of (Fe/Si) n multilayer film nanostructures
Место публикации : Phys. Solid State: MAIK NAUKA/INTERPERIODICA/SPRINGER, 2007. - Vol. 49, Is. 8. - P1470-1475. - ISSN 1063-7834, DOI 10.1134/S1063783407080124
Примечания : Cited References: 36
Предметные рубрики: GIANT MAGNETORESISTANCE
FE/SI MULTILAYERS
ULTRAHIGH-VACUUM
SUPERLATTICES
EXCHANGE
RESONANCE
LAYER
Аннотация: The temperature dependence of the magnetization of (Fe/Si) (n) multilayer films with nanometer layers is investigated. The films are prepared through thermal evaporation under ultrahigh vacuum onto Si(100) and Si(111) single-crystal substrates. It is revealed that the thickness of individual iron layers in (Fe/Si) (n) multilayer films affects the magnetization and its temperature dependence. The inference is made that this dependence is associated with the formation of a chemical interface at the Fe-Si boundaries. The characteristics of the chemical interface in the (Fe/Si) (n) films are estimated.
WOS,
Scopus,
РИНЦ,
Смотреть статью,
Читать в сети ИФ
Найти похожие