Библиотека института физики им. Л.В. Киренского СО РАН

Главная

Базы данных

Труды сотрудников ИФ СО РАН - результаты поиска

Вид поиска

Каталог книг и брошюр библиотеки ИФ СО РАН

Каталог журналов библиотеки ИФ СО РАН

Труды сотрудников ИФ СО РАН

Область поиска

Формат представления найденных документов:
полный	информационный	краткий

Отсортировать найденные документы по:
автору	заглавию	году издания	типу документа

Поисковый запрос: (<.>S=SUPPRESSION<.>)

Общее количество найденных документов : 2
Показаны документы с 1 по 2

Spontaneous dc current generation in a resistively shunted semiconductor superlattice driven by a terahertz field / K. N. Alekseev [et al.] // Phys. Rev. Lett. - 1998. - Vol. 80, Is. 12. - P. 2669-2672, DOI 10.1103/PhysRevLett.80.2669. - Cited References: 21 . - ISSN 0031-9007

РУБ Physics, Multidisciplinary
Рубрики:
DYNAMIC LOCALIZATION
   BLOCH OSCILLATIONS
   ELECTRIC-FIELD
   THZ-FIELD
   PENDULUM
   CHAOS
   TIME
   SUPPRESSION
   SYSTEMS
Аннотация: We study a resistively shunted semiconductor superlattice subject to a high-frequency electric field. Using a balance equation approach that incorporates the influence of the electric circuit, we determine numerically a range of amplitude and frequency of the ac field for which a de bias and current are generated spontaneously and show that this region is likely accessible to current experiments. Our simulations reveal that the Bloch frequency corresponding to the spontaneous de bias is approximately an integer multiple of the ac field frequency.

WOS,
Читать в сети ИФ
Держатели документа:
Univ Illinois, Dept Phys, Urbana, IL 61801 USA
NORDITA, DK-2100 Copenhagen O, Denmark
LV Kirensky Phys Inst, Theory Nonlinear Proc Lab, Krasnoyarsk 660036, Russia
Loughborough Univ Technol, Dept Phys, Loughborough LE11 3TU, Leics, England
ИФ СО РАН

Доп.точки доступа:
Alekseev, K. N.; Cannon, E. H.; McKinney, J. C.; Kusmartsev, F. V.; Campbell, D. K.
}
Найти похожие

Altunin, R. R.
Effect of the structural properties on the electrical resistivity of the Al/Ag thin films during the solid-state reaction / R. R. Altunin, E. T. Moiseenko, S. M. Zharkov // Phys. Solid State. - 2020. - Vol. 62, Is. 4. - P. 708-713, DOI 10.1134/S1063783420040034. - Cited References: 43. - This study was supported by the Russian Science Foundation, project no. 18-13-00080. . - ISSN 1063-7834. - ISSN 1090-6460

РУБ Physics, Condensed Matter
Рубрики:
LIGHT-EMITTING-DIODES
   PHASE-FORMATION
   AG
   AL
   DIFFUSION
   SUPPRESSION
   INTERFACE
   SURFACE
   GROWTH
   HEAT
Кл.слова (ненормированные):
thin films -- phase formation -- Al/Ag -- solid-state reaction; -- electron diffraction -- resistivity
Аннотация: Based on the results of in situ electron diffraction study of the solid-state reaction and electrical resistivity measurements on the Al/Ag thin films with an atomic ratio of Al : Ag = 1 : 3, the temperature of the reaction onset has been established and a model of the structural phase transitions has been proposed. The solid-state reaction begins at 70°C with the formation of the Al–Ag solid solution at the interface between the aluminum and silver nanolayers. It has been found that, in the course of the reaction, the intermetallic compounds γ-Ag2Al → μ-Ag3Al are successively formed. It is shown that the possibility of the formation of the μ‑Ag3Al phase during the solid-state reaction in the Al/Ag thin films depends on the aluminum-to-silver ratio, while the formation of the μ-Ag3Al phase begins only after all fcc aluminum has reacted.

Смотреть статью,
Scopus,
WOS,
Читать в сети ИФ

Публикация на русском языке Алтунин Р. Р. Влияние структурных свойств на электросопротивление тонких пленок Al/Ag в процессе твердофазной реакции [Текст] / Р. Р. Алтунин, Е. Т. Моисеенко, С. М. Жарков // Физ. тверд. тела. - 2020. - Т. 62 Вып. 4. - С. 621-626

Держатели документа:
Siberian Fed Univ, Krasnoyarsk 660041, Russia.
Russian Acad Sci, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk Sci Ctr, Krasnoyarsk 660036, Russia.

Доп.точки доступа:
Moiseenko, E. T.; Zharkov, S. M.; Жарков, Сергей Михайлович; Russian Science FoundationRussian Science Foundation (RSF) [18-13-00080]
}
Найти похожие