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Possibility of a 2D SiC monolayer formation on Mg(0001) and MgO(111) substrates / A. A. Kuzubov [et al.] // Russ. J. Phys. Chem. A. - 2013. - Vol. 87, Is. 8. - P. 1332-1335, DOI 10.1134/S0036024413080141. - Cited References: 25 . - ISSN 0036-0244

РУБ Chemistry, Physical
Рубрики:
AB-INITIO
   THIN-FILMS
   NANOTUBES
   ENERGY
Кл.слова (ненормированные):
silicon carbide monolayer -- density functional theory
Аннотация: The geometrical characteristics of a 2D SiC monolayer on Mg(0001) and MgO(111) plates regarded as potential materials for growing two-dimensional silicon carbide were studied. The most favorable positions of the atoms of 2D SiC on the substrates were determined. In the 2D SiC/Mg(0001) system, unlike in 2D SiC/MgO(111), the deviation of the carbon atom from the silicon carbide monolayer was insignificant (0.08 ). Consequently, magnesium can be used as a substrate for growing two-dimensional silicon carbide. The use of MgO(111) is not recommended because of a significant distortion of the 2D SiC surface.

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Публикация на русском языке Возможность образования монослоя 2D SIC на подложках Mg(0001) и MgO(111). - [S. l. : s. n.]

Держатели документа:
Siberian Fed Univ, Krasnoyarsk, Russia
Russian Acad Sci, Siberian Branch, Kirenskii Inst Phys, Krasnoyarsk, Russia
Siberian State Univ Technol, Krasnoyarsk, Russia

Доп.точки доступа:
Kuzubov, A. A.; Кузубов, Александр Александрович; Eliseeva, N. S.; Krasnov, P. O.; Краснов, Павел Олегович; Tomilin, F. N.; Томилин, Феликс Николаевич; Fedorov, A. S.; Федоров, Александр Семенович; Tolstaya, A. V.
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Theoretical study of sorption and diffusion of lithium atoms on the surface of crystalline silicon and inside it / A. A. Kuzubov [et al.] // JETP Letters. - 2013. - Vol. 97, Is. 11. - P. 634-638, DOI 10.1134/S0021364013110088 . - ISSN 0021-3640
Аннотация: The energy of the sorption and diffusion of lithium atoms on the reconstructed (4 ? 2) (100) silicon surface in the process of their transport into near-surface layers, as well as inside crystalline silicon, at various lithium concentrations have been investigated within the density functional theory. It has been shown that single lithium atoms easily migrate on the (100) surface and gradually fill the surface states (T3 and L) located in channels between silicon dimers. The diffusion of lithium into near-surface silicon layers is hampered because of high potential barriers of the transition (1.22 eV). The dependences of the binding energy, potential barriers, and diffusion coefficient inside silicon on distances to the nearest lithium atoms have also been examined. It has been shown that an increase in the concentration of lithium to the Li0.5Si composition significantly reduces the transition energy (from 0.90 to 0.36 eV) and strongly increases (by one to three orders of magnitude) the lithium diffusion rate. В© 2013 Pleiades Publishing, Ltd.

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Публикация на русском языке Теоретическое исследование сорбции и диффузии атомов лития на поверхности и внутри кристаллического кремния. - [S. l. : s. n.]

Держатели документа:
Siberian Fed Univ, Krasnoyarsk 660028, Russia
Russian Acad Sci, LV Kirensky Phys Inst, Siberian Branch, Krasnoyarsk 660036, Russia
Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia

Доп.точки доступа:
Kuzubov, A. A.; Кузубов, Александр Александрович; Eliseeva, N. S.; Popov, Z. I.; Попов, Захар Иванович; Fedorov, A. S.; Федоров, Александр Семенович; Serzhantova, M. V.; Denisov, V. M.; Tomilin, F. N.; Томилин, Феликс Николаевич
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Теоретическое исследование сорбции и диффузии атомов лития на поверхности и внутри кристаллического кремния / А. А. Кузубов [и др.] // Письма в Журн. эксперим. и теор. физ. - 2013. - Т. 97, Вып. 11. - С. 732-736DOI 10.7868/S0370274X13110064
Аннотация: В рамках теории функционала плотности изучены энергия сорбции и диффузия атомов лития по реконструированной (4× 2) поверхности (100) кремния при их переходе в подповерхностные слои, а также внутри кристаллического кремния при различной концентрации лития. Показано, что одиночные атомы лития легко мигрируют по поверхности (100), постепенно заполняя поверхностные состояния (Т3 и L), расположенные в каналах между димерами кремния. Диффузия лития в подповерхностные слои кремния затруднена в связи с высокими потенциальными барьерами перехода (1.22 эВ). Также исследованы зависимости энергии связи, потенциальных барьеров и коэффициента диффузии атомов лития внутри кремния от расстояний до ближайших атомов лития. Показано, что увеличение его концентрации до состава Li0.5Si существенно снижает энергию перехода (с 0.90 до 0.36 эВ) и вызывает значительное (на 1-3 порядка) увеличение скорости диффузии лития.

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Переводная версия Theoretical study of sorption and diffusion of lithium atoms on the surface of crystalline silicon and inside it. - [Б. м. : б. и.]

Держатели документа:
Институт физики им. Л.В. Киренского СО РАН

Доп.точки доступа:
Кузубов, Александр Александрович; Kuzubov, A. A.; Елисеева, Наталья Сергеевна; Попов, Захар Иванович; Popov, Z.I.; Федоров, Александр Семенович; Fedorov, A. S.; Сержантова, Мария Викторовна; Денисов, Виктор Михайлович; Томилин, Феликс Николаевич; Tomilin, F. N.
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Extremely large magnetoresistance induced by optical irradiation in the Fe/SiO2/p-Si hybrid structure with Schottky barrier / N. V. Volkov [et al.] // J. Appl. Phys. - 2013. - Vol. 114, Is. 9. - Ст. 093903. - P. , DOI 10.1063/1.4819975. - Cited References: 31. - This study was supported by the Russian Foundation for Basic Research, Project No. 11-02-00367-a; Presidium of the Russian Academy of Sciences, program Quantum Mesoscopic and Disordered Structures, Project No. 20.8; the Division of Physical Sciences of the Russian Academy of Sciences, program Spin Phenomena in Solids Nanostructures and Spintronics, Project No. II.4.3; the Siberian Branch of the Russian Academy of Sciences, integration projects nos. 43, 85 and 102; Project of the Russian Ministry of Education and Science N 02.G25.31.0043. . - ISSN 0021-8979

РУБ Physics, Applied
Рубрики:
SPIN POLARIZATION
SPINTRONICS
SILICON
Аннотация: We report giant magnetoresistance (MR) effect that appears under the influence of optical radiation in common planar device built on Fe/SiO2/p-Si hybrid structure. Our device is made of two Schottky diodes connected to each other by the silicon substrate. Photo-induced MR is positive and the MR ratio reaches the values in excess of 10(4)%. The main peculiarity of the MR behavior is its strong dependence on the magnitude and the sign of the bias current across the device and, most surprisingly, upon polarity of the magnetic field. To explain such unexpected behavior of the MR, one needs to take into account contribution of several physical mechanisms. The main contribution comes from the existence of localized interface states at the SiO2/p-Si interface, which provide the spots for the photo-current conduction by virtue of the sequential tunneling through them or thermal generation and optical excitation of mobile charges. External magnetic field changes the probability of these processes due to its effect on the energy states of the conduction centers. Two possible mechanisms that may be responsible for the observed dependence of magneto-resistance on the field polarity are discussed: the effect of the Lorentz force on moving carriers and spin splitting of electrons moving in the electrostatic potential gradient (Rashba effect). The most significant observation, in our opinion, is that the observed MR effect is seen exclusively in the subsystem of minority carriers transferred into non-equilibrium state by optical excitation. We suggest that building such magneto-sensitive devices based on this mechanism may set a stage for new types of spintronic devices to emerge. (C) 2013 AIP Publishing LLC.

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Держатели документа:
SB RAS, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia
Siberian State Aerosp Univ, Inst Space Technol, Krasnoyarsk 660014, Russia

Доп.точки доступа:
Volkov, N. V.; Волков, Никита Валентинович; Tarasov, A. S.; Тарасов, Антон Сергеевич; Eremin, E. V.; Еремин, Евгений Владимирович; Baron, F. A.; Барон, Филипп Алексеевич; Varnakov, S. N.; Варнаков, Сергей Николаевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Russian Foundation for Basic Research [11-02-00367-a]; Presidium of the Russian Academy of Sciences, program Quantum Mesoscopic and Disordered Structures [20.8]; Division of Physical Sciences of the Russian Academy of Sciences, program Spin Phenomena in Solids Nanostructures and Spintronics [II.4.3]; Siberian Branch of the Russian Academy of Sciences [43, 85, 102]; Russian Ministry of Education and Science [N 02.G25.31.0043]
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Magnetic anisotropy in Fe films deposited on SiO2/Si(001) and Si(001) substrates / S. V. Komogortsev [et al.] // J. Magn. Magn. Mater. - 2014. - Vol. 351. - P. 104-108, DOI 10.1016/j.jmmm.2013.09.058. - Cited References: 40. - The work has been supported by RFBR Grant 11-03-00168-a, 12-02-00943-a, 13-02-01265-a, Interdisciplinary integration of fundamental research of SB RAS (2012-2014) project No. 64. Also the study was supported by The Ministry of Education and Science of Russian Federation, project 14.513.11.0016. . - ISSN 0304-8853. - ISSN 873-4766

РУБ Materials Science, Multidisciplinary + Physics, Condensed Matter
Рубрики:
UNIAXIAL ANISOTROPY
   SURFACE
   SILICON
   ROUGHNESS
Кл.слова (ненормированные):
Epitaxial growth -- Iron -- Magnetic anisotropy -- Thin film
Аннотация: The magnetic anisotropy of 10 nm iron films deposited in an ultra high vacuum on the Si(001) surface and on the Si(001) over caped by 1.5 nm layer of SiO2 was investigated. There is in-plane uniaxial magnetic anisotropy caused by oblique sputtering in the Fe films on a SiO2 buffer layer. The easy magnetization axis is always normal to the atomic flux direction but the value of the anisotropy field is different depending on the axial angle among sputtering direction and the substrate crystallographic axes. It is argued that the uniaxial magnetic anisotropy results from elongated surface roughness formation during film deposition. Several easy magnetization axes are found in Fe/Si(001) film without the SiO2 buffer layer. The mutual orientation of the main easy axes and Si crystallographic axes indicates that there is epitaxial growth of Fe/Si(001) film with the following orientation relative to the substrate: Fe[100] ?Si[110]. The anisotropy energy of Fe/Si(001) film is estimated by simulation of angle dependence of remnant magnetization m r as the sum of the mr angle plot from uniaxial anisotropy (induced by oblique deposition) and the polar plot from biaxial magnetocrystalline anisotropy. В© 2013 Elsevier B.V.

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Держатели документа:
Kirensky Inst Phys SB RAS, Krasnoyarsk 660036, Russia
Siberian State Technol Univ, Krasnoyarsk 660000, Russia
Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia
Siberian Fed Univ, Krasnoyarsk 660041, Russia

Доп.точки доступа:
Komogortsev, S. V.; Комогорцев, Сергей Викторович; Varnakov, S. N.; Варнаков, Сергей Николаевич; Satsuk, S. A.; Сацук, Светлана Александровна; Yakovlev, I. A.; Яковлев, Иван Александрович; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич
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Theoretical study of the diffusion of lithium in crystalline and amorphous silicon / A. S. Fedorov [et al.] // JETP Letters. - 2012. - Vol. 95, Is. 3. - P. 143-147, DOI 10.1134/S0021364012030058. - Cited References: 28. - We are grateful to the Institute of Computational Modeling, Siberian Branch, Russian Academy of Sciences; the Interdepartmental Supercomputer Center, Russian Academy of Sciences; and the Computer Center, Siberian Federal University, for the use of their computer clusters for performing all calculations. This work was supported by the Ministry of Education and Science of the Russian Federation (federal program "Human Capital for Science and Education in Innovative Russia" for 2009-2013). . - ISSN 0021-3640

РУБ Physics, Multidisciplinary
Рубрики:
ACCELERATED MOLECULAR-DYNAMICS
   AB-INITIO
   INFREQUENT EVENTS
   SIMULATION
   RELAXATION
   HYDROGEN
   POINTS
   SI
Аннотация: The effect of the lattice deformation on potential barriers for the motion of a lithium atom in crystalline silicon has been studied through ab initio density functional calculations. A new universal method of calculating the diffusion coefficient of an admixture in amorphous solid media through the activation mechanism has been proposed on the basis of these data. The method is based on the calculation of the statistical distribution of potential barriers for the motion of an admixture atom between minima depending on the position of neighboring atoms. First, the amorphous structure, which is generated by annealing from the crystalline structure with vacancies, has been simulated. Then, the statistical distribution of the potential barriers in the amorphous structure for various local environments of the admixture atoms has been calculated by means of linear regression with the parameters determined for barriers in crystalline silicon subjected to different deformations. The diffusion coefficient of the admixture has been calculated from this distribution by using the Arrhenius formula. This method has been tested by the example of crystalline and amorphous silicon with admixture of lithium atoms. The method demonstrates that the diffusion of lithium in amorphous silicon is much faster than that in crystalline silicon; this relation is confirmed experimentally.

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Публикация на русском языке Теоретическое исследование диффузии лития в кристаллическом и аморфном кремнии [Текст] / А. С. Федоров [и др.] // Письма в Журн. эксперим. и теор. физ. : Наука, 2012. - Т. 95 Вып. 3-4. - С. 159-163

Держатели документа:
[Fedorov, A. S.
Popov, Z. I.
Ovchinnikov, S. G.] Russian Acad Sci, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia
[Kuzubov, A. A.] Siberian Fed Univ, Krasnoyarsk 660041, Russia

Доп.точки доступа:
Fedorov, A. S.; Федоров, Александр Семенович; Popov, Z. I.; Попов, Захар Иванович; Kuzubov, A. A.; Кузубов, Александр Александрович; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич
}
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Теоретическое исследование диффузии лития в кристаллическом и аморфном кремнии / А. С. Федоров [и др.] // Письма в Журн. эксперим. и теор. физ. - 2012. - Т. 95, Вып. 3. - С. 159-163 . - ISSN 0370-274X
Аннотация: Методом ab initio DFT-расчетов проведено исследование влияния деформации решетки на величины потенциальных барьеров для движения атома лития в кристаллическом кремнии. C использованием этих данных предложен новый универсальный метод расчета коэффициента диффузии примеси в аморфных твердых средах, происходящей по активационному механизму. Метод основан на вычислении статистического распределения величин потенциальных барьеров для движения атома примеси между минимумами в зависимости от положения соседних атомов. При этом вначале проводится моделирование аморфной структуры, генерируемой методом отжига из кристаллической структуры с вакансиями. Далее с помощью линейной регрессии с параметрами, определяемыми для барьеров в кристаллическом кремнии, подвергаемом различной деформации, вычисляется статистическое распределение потенциальных барьеров в аморфной структуре для различных локальных окружений атома примеси. Из полученного распределения с применением формулы Аррениуса вычисляется коэффициент диффузии примеси. Представленный метод протестирован на примере кристаллического и аморфного кремния с примесью атомов лития. Метод показал существенное ускорение диффузии лития в аморфном кремнии по сравнению с кристаллическим, что подтверждается экспериментами.

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Переводная версия Theoretical study of the diffusion of lithium in crystalline and amorphous silicon // JETP Letters : MAIK Nauka-Interperiodica / Springer, 2012. - Vol. 95, Is. 3. - P.143-147. - ISSN 0021-3640

Держатели документа:
Институт физики им. Л.В. Киренского СО РАН

Доп.точки доступа:
Федоров, Александр Семенович; Fedorov, A. S.; Попов, Захар Иванович; Popov, Z.I.; Кузубов, Александр Александрович; Kuzubov, A. A.; Овчинников, Сергей Геннадьевич; Ovchinnikov, S. G.
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Bias-current and optically driven transport properties of the hybrid Fe/SiO 2/p-Si structures / N. V. Volkov [et al.] // Diffusion and Defect Data Pt.B: Solid State Phenomena. - 2012. - Vol. 190. - P. 526-529, DOI 10.4028/www.scientific.net/SSP.190.526 . - ISBN 1012-0394. - ISBN 9783037854365
Кл.слова (ненормированные):
Hybrid structure -- Mis transition -- Photoelectric effect -- Schottky barrier -- Channel switching -- Comparative analysis -- Electron hole pairs -- Fe films -- Fe layer -- Ferromagnetic films -- Hybrid structure -- Optical effects -- Optical radiations -- Photogeneration -- Planar geometries -- Schottky barriers -- Semiconductor substrate -- Temperature variation -- Critical currents -- Interfaces (materials) -- Magnetic materials -- Photoelectricity -- Schottky barrier diodes -- Silicon -- Switching circuits -- Transport properties
Аннотация: Pronounced optical- and bias-current-sensitive features of the transport properties of a Fe/SiO 2/p-Si hybrid structure in planar geometry at temperature variation are investigated. Comparative analysis of two Fe/SiO 2/p-Si samples, one with a continuous Fe film and the other with two electrodes formed from a Fe layer and separated by a micron gap, shows that these features are due to the MIS transition with a Schottky barrier near the interface between SiO 2 and p- Si. Resistance of such a MIS transition depends exponentially on temperature and bias. In the structure with a continuous ferromagnetic film, the competition between conductivities of the MIS transition and the Fe layer results in the effect of current channel switching between the Fe layer and a semiconductor substrate. Within certain limits, this process can be controlled by a bias current and optical radiation. The mechanism of the optical effect is photogeneration of electron-hole pairs in the semiconductor substrate near its boundary with SiO 2 layer. В© (2012) Trans Tech Publications.

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Доп.точки доступа:
Volkov, N. V.; Волков, Никита Валентинович; Eremin, E. V.; Еремин, Евгений Владимирович; Tarasov, A. S.; Тарасов, Антон Сергеевич; Varnakov, S. N.; Варнаков, Сергей Николаевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Moscow International Symposium on Magnetism(5 ; 2011 ; Aug. ; 21-25 ; Moscow)
}
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Fedorov, A. S.
Development of the new empirical potential based on first-principles calculations of silicon nanostructures and its application to modeling of the amorphous silicon / A. S. Fedorov, M. A. Vysotin // Asian School-Conference on Physics and Technology of Nanostructured Materials. - 2013. - P. 145-146

Материалы конференции

Доп.точки доступа:
Vysotin, M. A.; Высотин, Максим, Александрович; Федоров, Александр Семенович; Asian School-Conference on Physics and Technology of Nanostructured Materials(2 ; 2013 ; Aug. ; 20-27 ; Vladivostok); Азиатская школа-конференция по физике и технологии наноструктурированных материалов(2 ; 2013 ; авг. ; 20-27 ; Владивосток)
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10.

Theoretical study of the lithium diffusion in the crystalline and amorphous silicon, as well as on its surface at different lithium concentrations / A. S. Fedorov [и др.] // Asian School-Conference on Physics and Technology of Nanostructured Materials. - 2013. - P. 133-134

Материалы конференции

Доп.точки доступа:
Fedorov, A. S.; Федоров, Александр Семенович; Kuzubov, A. A.; Кузубов, Александр Александрович; Eliseeva, N. S.; Popov, Z. I.; Попов, Захар Иванович; Asian School-Conference on Physics and Technology of Nanostructured Materials(2 ; 2013 ; Aug. ; 20-27 ; Vladivostok); Азиатская школа-конференция по физике и технологии наноструктурированных материалов(2 ; 2013 ; авг. ; 20-27 ; Владивосток)
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11.

Magnetic-field- and bias-sensitive conductivity of a hybrid Fe/SiO 2/p-Si structure in planar geometry / N. V. Volkov [et al.] // J. Appl. Phys. - 2011. - Vol. 109, Is. 12. - Ст. 123924. - P. , DOI 10.1063/1.3600056 . - ISSN 0021-8979
Кл.слова (ненормированные):
Channel switching -- Comparative analysis -- Fe films -- Fe layer -- Ferromagnetic films -- High temperature -- Hybrid structure -- Inversion layer -- Metal-insulator-semiconductors -- Negative magneto-resistance -- Planar geometries -- Positive magnetoresistance -- Schottky barriers -- Semiconductor substrate -- Temperature variation -- Weak localization -- Critical currents -- Electric resistance -- Ferromagnetic materials -- Geometry -- Magnetic fields -- Magnetoelectronics -- Magnetoresistance -- Metal insulator boundaries -- Metal insulator transition -- MIS devices -- Schottky barrier diodes -- Silicon -- Silicon compounds -- Switching circuits -- Transport properties -- Semiconducting silicon
Аннотация: Pronounced magnetic-field- and bias-sensitive features of the transport properties of a Fe/SiO2/p-Si hybrid structure in planar geometry at temperature variation are investigated. Comparative analysis of two Fe/SiO 2/p-Si samples, one with a continuous Fe film and the other with two electrodes formed from a Fe layer and separated by a micron gap, shows that these features are due to the metal-insulator-semiconductor (MIS) transition with a Schottky barrier near the interface between SiO2 and p-Si. Resistance of such a MIS transition depends exponentially on temperature and bias. In the structure with a continuous ferromagnetic film, the competition between conductivities of the MIS transition and the Fe layer results in the effect of current channel switching between the Fe layer and a semiconductor substrate. Within certain limits, this process can be controlled by a bias current and a magnetic field. Positive magnetoresistance of the structures at high temperatures is determined, most likely, by disorder-induced weak localization. In the structure with the gap, negative magnetoresistance is observed at certain temperature and bias. Its occurrence should be attributed to an inversion layer formed in the semiconductor near the SiO2/p-Si interface when MIS transition is in the inversion regime. В© 2011 American Institute of Physics.

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Держатели документа:
Kirensky Institute of Physics, Russian Academy of Sciences, Siberian Branch, Krasnoyarsk, 660036, Russian Federation
Siberian State Aerospace University, Krasnoyarsk 660014, Russian Federation

Доп.точки доступа:
Volkov, N. V.; Волков, Никита Валентинович; Tarasov, A. S.; Тарасов, Антон Сергеевич; Eremin, E. V.; Еремин, Евгений Владимирович; Varnakov, S. N.; Варнаков, Сергей Николаевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Zharkov, S. M.; Жарков, Сергей Михайлович
}
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12.

Frequency-dependent magnetotransport phenomena in a hybrid Fe/SiO2/p-Si structure / N. V. Volkov [et al.] // J. Appl. Phys. - 2012. - Vol. 112, Is. 12. - Ст. 123906, DOI 10.1063/1.4769788. - Cited References: 31. - This study was supported by the Russian Foundation for Basic Research, Project No. 11-02-00367-a; the Presidium of the Russian Academy of Sciences, program Quantum Mesoscopic and Disordered Structures, Project No. 20.8; the Division of Physical Sciences of the Russian Academy of Sciences, program Spin Phenomena in Solids Nanostructures and Spintronics, Project No. II.4.3; the Siberian Branch of the Russian Academy of Sciences, Integration Projects Nos. 85 and 102, and the Federal target program Scientific and Pedagogical Personnel of Innovative Russia (State Contract No. NK-556P_15). . - ISSN 0021-8979

РУБ Physics, Applied
Рубрики:
SILICON
   IRON
   SPINTRONICS
   PAIRS
Аннотация: We report the large magnetoimpedance effect in a hybrid Fe/SiO2/p-Si structure with the Schottky barrier. The pronounced effect of magnetic field on the real and imaginary parts of the impedance has been found at temperatures 25-100K in two relatively narrow frequency ranges around 1 kHz and 100MHz. The observed frequency-dependent magnetotransport effect is related to the presence of localized "magnetic" states near the SiO2/p-Si interface. In these states, two different recharging processes with different relaxation times are implemented. One process is capture-emission of carriers that involves the interface levels and the valence band; the other is the electron tunneling between the ferromagnetic electrode and the interface states through SiO2 potential barrier. In the first case, the applied magnetic field shifts energy levels of the surface states relative to the valence band, which changes recharging characteristic times. In the second case, the magnetic field governs the spin-dependent tunneling of carriers through the potential barrier. The "magnetic" interface states originate, most likely, from the formation of the centers that contain Fe ions, which can easily diffuse through the SiO2 layer. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4769788]

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Держатели документа:
[Volkov, N. V.
Tarasov, A. S.
Eremin, E. V.
Eremin, A. V.
Varnakov, S. N.
Ovchinnikov, S. G.] Russian Acad Sci, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia
[Volkov, N. V.
Eremin, E. V.
Varnakov, S. N.] Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia

Доп.точки доступа:
Volkov, N. V.; Волков, Никита Валентинович; Tarasov, A. S.; Тарасов, Антон Сергеевич; Eremin, E. V.; Еремин, Евгений Владимирович; Eremin, A. V.; Ерёмин, Александр Владимирович; Varnakov, S. N.; Варнаков, Сергей Николаевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич
}
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13.

Raman investigation of fibrous zeolites of the natrolite group at high pressures of an aqueous medium / S. V. Goryainov [et al.] // Bull. Russ. Acad. Sci.: Phys. - 2012. - Vol. 76, Is. 7. - P. 804-807, DOI 10.3103/S1062873812070143. - Cited References: 7 . - ISSN 1062-8738
Кл.слова (ненормированные):
Aqueous medium -- High pressure -- Intermediate phase -- Intermediate phasis -- Raman bands -- Raman investigations -- Water molecule -- XRD -- Raman spectroscopy -- Silicon -- Zeolites
Аннотация: The intermediate phases preceding overhydration are observed by Raman spectroscopy both in scolecite Ca[Al2Si3O10] вЂў 3H2O and in thomsonite NaCa2[Al5Si 5O20] вЂў 6H2O upon compression in an aque-ous medium. The first intermediate phase of scolecite is attributed to a phase precursor revealed earlier using XRD at pressure of ~1 GPa. The widening of the Raman bands of O-H vibrations caused by the disordering of H 2O, which appears after additional water molecules are embedded in the zeolite channels, is typical of this intermediate phase. It is assumed on the basis of the Raman spectroscopy data that scolecite contains sec-ond overhydrated and second intermediate phases. В© 2012 Allerton Press, Inc.

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Публикация на русском языке Исследование методом КР волокнистых цеолитов группы натролита при высоких давлениях водной среды [Текст] / С. В. Горяйнов [и др.] // Изв. РАН. Сер. физич. - 2012. - Т. 76 № 7. - С. 895-898

Держатели документа:
Sobolev Institute of Geology and Mineralogy, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russian Federation
Novosibirsk State University, Novosibirsk, 630090, Russian Federation
Kirenskii Institute of Physics, Siberian Branch, Russian Academy of Sciences, Krasnoyarsk, 660036, Russian Federation

Доп.точки доступа:
Goryainov, S. V.; Krylov, A. S.; Крылов, Александр Сергеевич; Likhacheva, A.Yu.; Vtyurin, A. N.; Втюрин, Александр Николаевич
}
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14.

Calculating the energy of vacancies and adatoms in a hexagonal SiC monolayer / A. A. Kuzubov [et al.] // Russ. J. Phys. Chem. A. - 2012. - Vol. 86, Is. 7. - P. 1091-1095, DOI 10.1134/S0036024412070138. - Cited References: 21 . - ISSN 0036-0244

РУБ Chemistry, Physical
Рубрики:
INITIO MOLECULAR-DYNAMICS
ELECTRONIC-PROPERTIES
ABSORPTION-SPECTRA
Кл.слова (ненормированные):
silicon carbide -- defects -- adatoms -- density functional method
Аннотация: It is noted that the development of semiconductor SiC-electronics is prevented by a low quality of grown silicon carbide single crystals. It is found that structural defects of a substrate penetrating into an epitaxial layer upon subsequent homoepitaxial growth can considerably degrade a device's characteristics. We investigate the effect of the deformation of a hexagonal SiC monolayer on vacancy stability and material properties, and study the processes of silicon and carbon adatom migration over a surface of SiC.

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Публикация на русском языке Расчет энергии вакансий и адатомов в монослое гексагонального SiC [Текст] / А. А. Кузубов [и др.] // Журн. физ. химии. - 2012. - Т. 86 № 7. - С. 1207-1211

Держатели документа:
[Kuzubov, A. A.
Eliseeva, N. S.
Tomilin, F. N.
Tolstaya, A. V.] Siberian Fed Univ, Krasnoyarsk 660041, Russia
[Kuzubov, A. A.
Krasnov, P. O.
Tomilin, F. N.
Fedorov, A. S.] Russian Acad Sci, LV Kirensky Phys Inst, Siberian Branch, Krasnoyarsk 660036, Russia
[Kuzubov, A. A.
Krasnov, P. O.] Siberian State Technol Univ, Krasnoyarsk 660049, Russia

Доп.точки доступа:
Kuzubov, A. A.; Кузубов, Александр Александрович; Eliseeva, N. S.; Krasnov, P. O.; Краснов, Павел Олегович; Tomilin, F. N.; Томилин, Феликс Николаевич; Fedorov, A. S.; Федоров, Александр Семенович; Tolstaya, A. V.
}
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15.

Initial growth stages of manganese films on the Si(100)2 x 1 surface / S. N. Varnakov [et al.] // Phys. Solid State. - 2014. - Vol. 56, Is. 2. - P. 380-384, DOI 10.1134/S1063783414020310. - Cited References: 20. - This study was supported by the Russian-German Laboratory at HZB BESSY, the Ministry of Education and Science of the Russian Federation (agreement 14V37.21.1276), and the Russian Foundation for Basic Research (project nos. 13-02-00398 and 13-02-01265). . - ISSN 1063-7834. - ISSN 1090-6460

РУБ Physics, Condensed Matter
Рубрики:
PHOTOELECTRON-SPECTROSCOPY
   ROOM-TEMPERATURE
   SILICIDES
   SILICON
Аннотация: Initial growth stages of manganese films on the Si(100)2 × 1 surface at room temperature have been investigated using high-energy-resolution photoelectron spectroscopy, and the dynamics of the variation in their phase composition and electronic structure with the coverage growth has been revealed. It has been shown that the interfacial manganese silicide and the film of the solid solution of silicon in manganese are sequentially formed under these conditions on the silicon surface. The growth of the metal manganese film starts after the deposition of ~0.9 nm Mn. Segregation of silicon on the film surface is observed in the range of coverages up to 1.6 nm Mn.

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Публикация на русском языке Начальные стадии роста пленок марганца на поверхности Si(100)2x1 [Текст] / С. Н. Варнаков [и др.] // Физ. тверд. тела. - 2014. - Т. 56 Вып. 2. - С. 375-379

Держатели документа:
Russian Acad Sci, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia
Reshetnev Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia
Russian Acad Sci, Ioffe Phys Tech Inst, St Petersburg 194021, Russia

Доп.точки доступа:
Varnakov, S. N.; Варнаков, Сергей Николаевич; Gomoyunova, M. V.; Grebenyuk, G. S.; Zabluda, V. N.; Заблуда, Владимир Николаевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Pronin, I. I.; Russian-German Laboratory at HZB BESSY; Ministry of Education and Science of the Russian Federation [14V37.21.1276]; Russian Foundation for Basic Research [13-02-00398, 13-02-01265]
}
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16.

Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films / I. A. Yakovlev [et al.] // JETP Letters. - 2014. - Vol. 99, Is. 9. - P. 527-530, DOI 10.1134/S0021364014090124. - Cited References: 19. - This work was supported by the Russian Foundation for Basic Research (project no. 13-02-01265), the Council of the President of the Russian Federation for Support of Young Scientists and Leading Scientific Schools (project no. NSh-2886.2014.2), and the Ministry of Education and Science of the Russian Federation (state contract no. 02G25.31.0043; state task of the Siberian Federal University for research in 2014). . - ISSN 0021-3640. - ISSN 1090-6487

РУБ Physics, Multidisciplinary
Рубрики:
ULTRAHIGH-VACUUM
SILICON
Аннотация: The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe3Si silicide film with the orientation Si[111]‖Fe3Si[111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe3Si film at room temperature has magnetic uniaxial anisotropy (H a = 26 Oe) and a relatively narrow uniform ferromagnetic resonance line (ΔH = 11.57 Oe) measured at a pump frequency of 2.274 GHz.

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Публикация на русском языке Исследование структурных и магнитных характеристик эпитаксиальных пленок Fe3Si/Si(111) [Текст] / И. А. Яковлев [и др.] // Письма в Журн. эксперим. и теор. физ. : Наука, 2014. - Т. 99 Вып. 9-10. - С. 610 – 613

Держатели документа:
Russian Acad Sci, Kirensky Inst Phys, Siberian Branch, Krasnoyarsk 660036, Russia
Reshetnev Siberian State Aerosp Univ, Krasnoyarsk 660014, Russia
Siberian Fed Univ, Krasnoyarsk 660041, Russia

Доп.точки доступа:
Yakovlev, I. A.; Яковлев, Иван Александрович; Varnakov, S. N.; Варнаков, Сергей Николаевич; Belyaev, B. A.; Беляев, Борис Афанасьевич; Zharkov, S. M.; Жарков, Сергей Михайлович; Molokeev, M. S.; Молокеев, Максим Сергеевич; Tarasov, I. A.; Тарасов, Иван Анатольевич; Ovchinnikov, S. G.; Овчинников, Сергей Геннадьевич; Russian Foundation for Basic Research [13-02-01265]; Council of the President of the Russian Federation for Support of Young Scientists and Leading Scientific Schools [NSh-2886.2014.2]; Ministry of Education and Science of the Russian Federation [02G25.31.0043]
}
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17.

Theoretical study of the lithium diffusion in the crystalline and amorphous silicon as well as on its surface [] / A. S. Fedorov [et al.] // Solid State Phenom. : Selected, peer reviewed papers. - 2014. - Vol. 213: Physics and Technology of Nanostructured Materials II. - P. 29-34, DOI 10.4028/www.scientific.net/SSP.213.29. - Cited References: 21 . - ISSN 1662-9779. - ISSN 978-3-037
Кл.слова (ненормированные):
Ab initio calculations -- Diffusion -- Lithium-ion accumulators -- Silicon
Аннотация: Using the PAW DFT-GGA method and numerical solving of master equation the diffusion rates of lithium atoms inside both crystal and amorphous silicon of LixSi (x= 0.0.5) composition have been calculated for different temperatures. It is shown the diffusion rate for amorphous silicon is ~10 times greater than that for the crystal silicon. For both structures the rate is increased by 1.5-2 orders of magnitude while the lithium concentration is increased up to 0.5 value. This should result in that the LixSi/Si interface will be sharp. This fact has been further confirmed using molecular dynamic calculations based on Angular Dependent Potential (ADP) model. Also binding energies of Li atoms lying on different sites of Si (001) surface as well as the potential barriers for the atom jumps both along the surface and in the subsurface layers have been calculated. The data show the Li atoms move along the surface very easily but their jumps into subsurface layers are very difficult due to the high potential barrier values. В© (2014) Trans Tech Publications, Switzerland.

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Доп.точки доступа:
Galkin, N. \ed.\; Fedorov, A. S.; Федоров, Александр Семенович; Kuzubov, A. A.; Кузубов, Александр Александрович; Eliseeva, N. S.; Popov, Z. I.; Попов, Захар Иванович; Visotin, M. A.; Galkin, N. G.; Asian School-Conference on Physics and Technology of Nanostructured Materials(2 ; 2013 ; Aug. ; 20-27 ; Vladivostok); Азиатская школа-конференция по физике и технологии наноструктурированных материалов(2 ; 2013 ; авг. ; 20-27 ; Владивосток)
}
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18.

Neutral pentacoordinate silicon complexes with SiO2FC skeleton:. Synthesis, structural characterization and stereodynamical behavior / M. G. Voronkov [et al.] // J. Organomet. Chem. - 2014. - Vol. 768. - P. 10-14, DOI 10.1016/j.jorganchem.2014.05.025. - Cited References: 31. - We thank the Found of President of Russian Federation (Science Schools' Grant - 3649.2014.3) and Russian Foundation for Basic Research (No. 14-03-31381 \14) for financial support. We thank Prof. Bagrat Shainyan (Irkutsk Institute of Chemistry) for calculation SUP19/SUPF NMR spectra and helpful discussion and Dr. Svetlana Kirpichenko (Irkutsk Institute of Chemistry) for all the help rendered. . - ISSN 0022-328X. - ISSN 1872-8561

РУБ Chemistry, Inorganic & Nuclear + Chemistry, Organic
Рубрики:
1,3-DIOXA-6-AZA-2-SILACYCLOOCTANES
   DIETHANOLAMINES
   DERIVATIVES
   SILATRANES
   REACTIVITY
   NITROGEN
   ELEMENTS
Кл.слова (ненормированные):
Pentacoordinate silicon -- 1-Fluoro-1-aryl-5-methylquasisilatranes -- Synthesis -- X-ray diffraction
Аннотация: A series of new pentacoordinate intramolecular organosilicon complexes F(Ar)Si(OCH2CH2)2NMe (Ar = 4-MeC6H4 (1), 4-MeOC6H4 (2), 4-ClC6H4 (3), 2-BrC6H4 (4), 3-NO2C6H4 (5)) has been synthesized by transsilylation of aryltrifluorosilanes ArSiF3 by N-methyl-bis(2-trimethylsiloxyethyl)amine. Compounds 1–5 have been fully characterized by 1H, 13C, 19F, 29Si NMR spectroscopy and X-ray diffraction analysis (for compound 3). Variable-temperature 19F NMR studies of 5 indicate stereodynamic process of the ligand exchange with activation barrier Δ G c ≠ of 13.1 kcal mol−1.

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Держатели документа:
Russian Acad Sci, Siberian Branch, AE Favorsky Irkutsk Inst Chem, Irkutsk 664033, Russia
East Siberian State Acad Educ, Irkutsk 664011, Russia
Russian Acad Sci, Siberian Branch, LV Kirensky Phys Inst, Krasnoyarsk 660036, Russia

Доп.точки доступа:
Voronkov, M. G.; Воронков, Михаил Григорьевич; Grebneva, E. A.; Albanov, A. I.; Zel'bst, E. A.; Зельбст, Элеонора Абрамовна; Trofimova, O. M.; Трофимова, Ольга Михайловна; Vasil'ev, A. D.; Васильев, Александр Дмитриевич; Chernov, N. F.; Timofeeva, E. N.; Found of President of Russian Federation [3649.2014.3]; Russian Foundation for Basic Research [14-03-31381 \14]
}
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19.

    Киренский, Леонид Васильевич.
    Исследование упругого гистерезиса, термоупругого эффекта в никеле и никель-кремнистых сплавах [Текст] / Л. В. Киренский, З. М. Патюкова // Изв. АН СССР, Сер. физич. - 1964. - Т. 28, № 1. - С. 198-201. - Библиогр.: 8 назв. - Phys. Abstr. - 1966. - Vol. 69, 5593
   Перевод заглавия: Investigation of elastic hysteresis of the thermoelastic effect in nickel and nickel-silicon alloys

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Держатели документа:
Институт физики им. Л.В. Киренского СО РАН

Доп.точки доступа:
Вонсовский, Сергей Васильевич \предс. орг. ком.\; Патюкова, З. М.; Kirenskii, L. V.; Симпозиум по вопросам ферро- и антиферромагнетизма (1962 ; 25 июня - 7 июля ; Красноярск)
}
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20.

Sorokin, B. P.
Influence of heterogeneous external fields on propagation of bulk acoustic waves in crystals / B. P. Sorokin, A. N. Marushyak, K. S. Aleksandrov // Proceedings - IEEE Ultrasonics Symposium. - 2008. - Ст. 4803313. - P. 1472-1475, DOI 10.1109/ULTSYM.2008.0358 . - ISBN 1051-0117
Кл.слова (ненормированные):
Bulk elastic wave -- Non-homogeneous mechanical loading -- Phase velocity -- Wave surface -- Bulk acoustic waves -- Bulk elastic wave -- Bulk waves -- External fields -- Non-homogeneous -- Non-homogeneous mechanical loading -- Numerical calculation -- Small amplitude -- Wave surface -- Acoustic fields -- Crystals -- Elastic waves -- Elasticity -- Phase velocity -- Silicon compounds -- Soil structure interactions -- Waves -- Velocity
Аннотация: Formulas describing the influence of nonhomogeneous pressure on propagation of bulk waves in crystals have derived. Phase velocity for small amplitude waves in Bi12SiO20 crystal the action of non-homogeneous pressure has been . Under those conditions the behavior of the wave has researched. Numerical calculation of phase velocity of and their directions propagation changing have obtained. В©2008 IEEE.

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Доп.точки доступа:
Marushyak, A. N.; Aleksandrov, K. S.; Александров, Кирилл Сергеевич; IEEE International ultrasonics symposium(2008 ; Nov. ; 2-5 ; Beijing, China)
}
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